continuing scaling will require the introduction of new materials.3 One of the key materials challenges, which if not addressed could interrupt the historical Moore’s law progression, is the replacement of the silicon dioxide layer with new gate dielectric materials.4 Despite a number of excellent...
Gaseous calcium and water are then added to form a calcium oxide gate dielectric, until the desired thickness has been achieved. In an alternative embodiment of the method, the calcium halide is transported to the silicon wafer to react with the hydroxyl groups, followed by transport of gaseous...
High-k Gate Dielectric 1. Introduction Among the three main components of the transistor – gate stack, source/drain, and channel length; gate stack has been the most sophisticated and sensitive part for it performance, yield and reliability. From the performance perspective, scaling of silicon ...
Interfacial barrier layer in semiconductor devices with high-K gate dielectric materialUS6693004 * 2002年2月27日 2004年2月17日 Advanced Micro Devices, Inc. Interfacial barrier layer in semiconductor devices with high-K gate dielectric material
Metal gate electrodeThe traditional gate dielectric material of SiO2 can not satisfy the need of the continuous downscaling of CMOS dimensions. High-K gate dielectric materials have attracted extensive research efforts recently and obtained great progress. In this paper, the developments of high gate ...
Materials problems of alternative high-k dielectric oxides for future metal-oxide-semiconductor field effect transistor (MOSFET) gate oxide application are examined from first-principles modeling perspective. We have analyzed the relationship between local atomic structures and the corresponding ionic contribut...
Advanced high-κ gate dielectric stacks directly deposited on Si or high mobility semiconductors such as Ge by MBE may offer the solution for aggressive scaling of future nanoelectronic devices. A new... A Dimoulas 被引量: 5发表: 2005年 加载更多研究点推荐 Gate dielectric materials ...
网络高介电闸极氧化层;栅电介质;门电介质 网络释义
(EMAILWIRE.COM, April 27, 2019 ) High-k dielectric material is defined as the material which has high dielectric constant k. These materials are principal insulators where negligible current flows from the material during the application of voltage thro
Remote scavenging technology using a Ti/TiN capping layer interposed in a metal/high-k gate stack High permittivity materials have been required to replace traditional SiO_2 as the gate dielectric to extend Moore's law.However,growth of a thin SiO_2-lik... 马雪丽,韩锴,王文武,... - 《Jour...