Holmes , " Negative photoresists for optical lithography ," IBM Journal of Research and Development 41 , 81 ( 1997 ).Shaw et al., " Negative Photoresists for Optical Lithograph ", IBM Journal of Research & Development, vol. 41, No. 1/2-Optical lithography, 1997....
Negative photoresists for optical lithography Negative photoresists are materials that become insoluble in developing solutions when exposed to optical radiation. They were the first systems used to pa... JM Shaw,JD Gelorme,NC Labianca,... - 《Ibm Journal of Research & Development》 被引量: ...
Twitter Google Share on Facebook photoresist (redirected fromNegative resists) Encyclopedia photoresist (ˌfəʊtəʊrɪˈzɪst) n 1.(Crafts) a material sensitive to light that is used in industrial processes such as the chemical etching of integrated circuits and in engraving ...
Acid Labile Cross-Linked Units: A Concept for Improved Positive Deep-UV Photoresists The transacetalization during the acid catalyzed reaction of vinyl ethers with aliphatic hydroxyl groups leads to a new polymer type which is useful in che... HT Schacht,P Falcigno,N Münzel,... - Acs ...
High resolution optical lithography by formation of a built on mask (B.O.M.) By means of a U.V. induced shift in absorption from 360 to 435 nm an image is formed in a photosensitive layers on top of a positive photoresist. Upon heat... FA Vollenbroek,WPM Nijssen,HJJ Kroon,... -...
Rapid stamp manufacturing using ma-N 2405 photoresist is also demonstrated. The processing scheme is a promising candidate for patterning of sensors featuring nanometre sized electrodes. Introduction Nanoimprint lithography (NIL) offers several advantages as compared to direct writing technologies (such as ...
Transparent and visible light-insensitive acrylic photoresist for negative tone optical lithography The film patterned by the resin Black Matrix (BM) photoresist, which has two features, the lower reflectivity and low stress on environment of a processing... DJ Carbaugh,S Kaya,F Rahman - American ...
1.Researches on the two-photon photopolymerization technology ofSU8 negative photoresisthave been processed.飞秒激光SU8负性光刻胶双光子聚合工艺研究。 2)SU8 lithographySU8光刻 1.The fabrication of micro-fluidic chips bySU8 lithographyon transparent substrate for integrated optical detection was studied,...
2005 Adouble-periodicarrayofpairsofparallelgoldnanorodsisshowntohaveanegativerefractiveindexinthe opticalrange.Suchbehaviorresultsfromtheplasmonresonanceinthepairsofnanorodsforboththeelec- tricandthemagneticcomponentsoflight.Therefractiveindexisretrievedfromdirectphaseandamplitude measurementsfortransmissionandreflection,...
At wavelengths of deep UV radiations, film transparency is not a problem. However, positive-tone photoresist has experienced great difficulties in dark-field lithography. When radiation dose is high enough to clear the exposed areas such as trenches or vias, dimensions of the areas are usually ex...