什么是光刻胶? | 刻胶(英语:photoresist),亦称为光阻或光刻胶,是指经过深紫外光等光照或辐射后,溶解度发生变化的耐蚀刻薄膜材料,是工艺中的关键材料,主要应用于和的细微图形加工。 光刻根据在显影过程中曝光区域的去除或保留可分为两种-正性光刻胶(positive photoresist)和负性光刻胶(negative photoresist)。
1. 正光阻剂 正光阻剂(Positive Photoresist) :抗酸材料在紫外 线照射前为不可溶解,照射后为可 溶解。 负光阻剂 (Negative Photoresist) … ja.scribd.com|基于218个网页 2. 正性胶 信息英语词汇(P) ... positive logic 正逻辑positive photoresist正性胶positive sign 正号 ... ...
photoreception photoreceptive photoreceptor photoreceptors photoreconnaisance photoreconnaissance photoreduce photoreduction photorefractive photorefractive keratectomy photorejuvenation Photorelief photoresist photoresistor photorespiration photoretinitis Photos â–¼...
9 RegisterLog in Sign up with one click: Facebook Twitter Google Share on Facebook positive phototaxis [¦päz·əd·iv ‚fōd·ō′tak·səs] (physiology) The orientation and movement of an organism toward the source of a light stimulus. ...
The positive and negative photoresist technology combined microstrip line manufacturing method includes: 1), spinning a layer of positive photoresist on glass sheets or silicon slices as a device releasing sacrificial layer; 2), deposing a layer of Cu metal on the positive photoresist via the ...
4) electron-beam positive photoresist 电子束正性抗蚀剂 5) negative photoresist 负性抗蚀剂 1. A new kind of chemically amplified negative photoresist without crosslinking agent was studied using this co-polymer as the base resin, which was developable in harmless NaOH-. 本文引入单体MAGME合成...
5) deep ultraviolet positive photoresist 远紫外正性光刻胶 6) UV lithography 紫外厚胶光刻 1. The UV lithography technology of SU-8 photoresist and its application in 3-D MEMS inductors are re-ported. 研究了紫外厚胶光刻技术在三维微机械电感中的应用。补充资料:正性光刻胶 分子式:CAS号:...
positive working photoresist 正性感光胶 photoresist process 光致抗蚀工艺 photoresist film 感光耐蚀膜 removing of photoresist 去胶 photoresist flow 光致抗蚀通道 negative photoresist 负型光刻胶,负性光致抗蚀剂 photoresist flaw 光蚀刻的伤痕 be positive 乐观 auxiliary reagent for negative photo...
PURPOSE:To prevent electrostatic breakage at ion implantation by adding conductive substances such as carbon, silicon, etc., to a positive photoresist. CONSTITUTION:Conductive substrates such as carbon, silicon, etc., are added to a positive photoresist so that it may have conductivity. For example...
Positive type 1,2-naphthoquinonediazide photoresist composition containing benzotriazole light absorbing agent There is disclosed a positive type photoresist composition comprising an alkali-soluble resin, a compound having a 1,2- naphthoquinonediazido group, and at least one light absorbing agent selected...