1. 正光阻剂 正光阻剂(Positive Photoresist) :抗酸材料在紫外 线照射前为不可溶解,照射后为可 溶解。 负光阻剂 (Negative Photoresist) … ja.scribd.com|基于218个网页 2. 正性胶 信息英语词汇(P) ... positive logic 正逻辑positive photoresist正性胶positive sign 正号 ... ...
positive working photoresist 正性感光胶 photoresist process 光致抗蚀工艺 photoresist film 感光耐蚀膜 removing of photoresist 去胶 photoresist flow 光致抗蚀通道 negative photoresist 负型光刻胶,负性光致抗蚀剂 photoresist flaw 光蚀刻的伤痕 be positive 乐观 auxiliary reagent for negative photo...
photorejuvenation Photorelief photoresist photoresistor photorespiration photoretinitis Photos ▼ Complete English Grammar Rules is now available in paperback and eBook formats. Make it yours today! Advertisement. Bad banner? Pleaselet us knowRemove Ads...
N. Wright, Positive and negative photoresist applications of thin films surface-photopolymerized from hexachlorobutadiene, Polymer Engineering and Science 12 (3) (1972) 209-212.C. O. Kunz, P. C. Long, and A. N. Wright, ``Positive and negative photoresist applications of thin films surface ...
Both positive and negative photoresists are still used in the semiconductor manufacturing industry today, but many semiconductor suppliers opt for positive photoresists due to their higher resolution capabilities. Positive photoresists are able to maintain their size and pattern as the photoresist developer...
Experiments on two-photon Optical storage in photoresist; 以光致抗蚀剂为记录介质的双光子存储实验 更多例句>> 6) water-soluble negative photoresist 水溶性负性光致抗蚀剂补充资料:干膜光致抗蚀剂 分子式:CAS号:性质: 将无溶剂型光致抗蚀剂涂在涤纶片基上,再覆上聚乙烯薄膜。使用时揭去聚乙烯薄膜,...
A positive photoresist composition which can form a thick resist pattern having high sensitivity. The positive photoresist composition comprises (A) a compound which generates an acid upon irradiation with actinic rays or a radiation and (B) a resin whose alkali solubility increases by the action of...
contrast or resolution and with virtually no less in unexposed areas of the photoresist and without significant outgassing or popping are provided by employing novel 1,2- diazonaphthoquinone-4- or -5- sulfonate esters of 2, 3,4,3',4',5'- hexahydroxybenzophenone with a novel isomeric distribut...
Positive working photoresists sensitive to visible light, II: poly{2‐arylpropyl‐2 andbis(p‐methoxyphenyl)methyl methacrylates}... Y Ohe,K Ichimura - 《Polymers for Advanced Technologies》 被引量: 0发表: 1992年 The Chemical Nature and Practical Processing Characterization of Positive Working Phot...
New series of chemically amplified, single layer, positive tone photoresists for 193 nm lithography have been developed. These resists were formulated from a series of cycloaliphatic co- and terpolymers of 2-methyl propyl bicyclo(2.2.1)hept-2- ene-5-carboxylate (carbo-tert-butoxynorbornene), bic...