分类号 G03F7/004 申请人信息 申请(专利权)人 CORNELL RESEARCH FOUNDATION, INC. 发明人FRECHET, JEAN M. J.;LEE, SZE-MING 地址-邮编- 代理人信息 代理机构 -代理人 - 摘要 A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor...
The frozen film works as a positive‐tone photoresist. When the frozen PPaP is irradiated with light containing a wavelength much shorter than 300 nm, the ester structure of the exposed region is decomposed by photo‐chemically generated acid and dissolved in an alkaline solution. Furthermore, a...
This paper reports on the results of the use of resolution enhancement techniques in combination with an advanced deep ultraviolet (DUV) photoresist on an ASML PAS5500/300 stepper (maximum numerical aperture (NA) = 0.63. The performance of 0.15 and 0.13 μm features will be evaluated using opti...
A new generation of negative tone photoresists: ma-N 400 A series of AZ-compatible negative photoresists composed of a novolak resin and azide sensitizers for the micro and nano-lithography is presented. The ma-N... G Grützner,S Fehlberg,A Voigt,... - Proceedings of SPIE - The Internat...
Negative photoresist for 157-nm microlithography: a progress report The design of 157 nm photoresists is a daunting task since air, water, and most organic compounds are opaque at this wavelength. Spectroscopic studies1 le... W Conley,BC Trinque,D Miller,... - 《Proceedings of Spie the Int...
A liquid phase (wet) silylation process has been developed1 using the commercial photoresist AZ 5214TM, and I-line lithography. Here, the process is characterized using proton NMR (Nuclear Magnetic Resonance) spectroscopy, and SEM analysis of fabricated submicron patterns.E....
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein Ris a C-Calkyl, cyclo alkyl, benzyl, phenyl, alkyl substituted cyclo alkyl, alkoxy ...
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R 1 is a C 1 -C 20 alkyl, cyclo alkyl, bensyl, phenyl, alkyl substituted cyclo ...
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R.sub.1 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, benzyl, phenyl, alkyl ...
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R.sub.1 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, bensyl, phenyl, alkyl ...