Advanced negative photoresists for both KrF-excimer laser lithography (DN 21) and deep-UV broadband irradiation (DN 41) have been investigated. The materials are based on the well established chemistry of an acid-sensitive melamine derivative as the crosslinking species, a phenolic polymer ...
aqueous solution as the developer the photoresist can be of negative tone. 用氢氧化钠-乙醇水溶液显影可以得到负性光刻图形; www.showxiu.com 6. Markets will continue to digest the Fed's outcome today and the negative tone filters through Asia today. 今天市场将继续消化联储局的讨论结果,亚洲弥漫著...
Vettiger, "High-aspect-ratio, ultrathick, negative-tone near-UV photoresist for MEMs applications," IEEE Proc. Int. Workshop on Micro-Electro Mechanical ... H.,Lorenz,and,... - 《Sensors & Actuators A》 被引量: 991发表: 1998年 High-aspect-ratio, ultrathick, negative-tone near-UV photor...
NR9-6000PY negative tone photoresist上下游产品信息 上游原料 下游产品 NR9-6000PY negative tone photoresist生产厂家 全球有 1家供应商NR9-6000PY negative tone photoresist国内生产厂家 供应商联系电话电子邮件国家产品数优势度 苏州诺行贸易有限公司0512-65816829 18662214788info@rovathin.com.cn中国965758...
The development of thick photoresist molds using JSR THB-151N negative tone UV photoresist for the electroplating of interconnects in advanced packaging technologies has been demonstrated. Two different thick photoresist molds 65 and 130 m high with aspect ratios of up to 2.6 have been fabricated ...
1.A liquid solvating composition for removing cured isoprene photoresist and BCB surface layers from an inorganic substrate comprising a blend offrom about 35 to about 55 weight percent of an alkylbenzene sulfonic acid,about 20 to about 30 weight percent anisole, andabout 20 to about 30 weight...
There are reasons for more publications on positive-tone than that on negative-tone polysiloxane and polysilsesquioxane photoresist. First, it is widely believed in the field of invention that positive-tone photoresist intrinsically has more resolving power than negative-tone photoresist. Therefore, resea...
This causes key differences in key patterning properties, such as pattern collapse, adhesion, remaining resist, and photoresist etch selectivity. We have carried out fundamental studies to understand these new interactions between developer and remaining resist with negative tone develop systems. We have...
Among them, the photosensitive polyimide photoresist products not only have the excellent physical properties of PI, compared with the traditional photoresists, but can also significantly shorten the process, so it can be used as a semiconductor device passivation film, surface protection film, ...
Stripper for cured negative-tone isoprene-based photoresist and bisbenzocyclobutene coatingsA chemical stripping solvent composition is provided for removing cured polymeric isoprene and bisbenzocyclobutene (BCB) substances from an inorganic substrate...