Disadvantages of standard negative-tone photoresists; Applications; Creation of photoactinic component with light absorption in the central part of the ultraviolet system.GreutznerGabiFehlbergSimoneSolid State Technology
aqueous solution as the developer the photoresist can be of negative tone. 用氢氧化钠-乙醇水溶液显影可以得到负性光刻图形; www.showxiu.com 6. Markets will continue to digest the Fed's outcome today and the negative tone filters through Asia today. 今天市场将继续消化联储局的讨论结果,亚洲弥漫著...
photoresist composition, method for forming a photoresist pattern and method for forming a protection layer of a semiconductor device using the photoresist compositionresist film on an object by coating the object with a photoresist comp... SB Park 被引量: 0发表: 2006年 Forming self-aligned patter...
Use of water soluble negative tone photoresist for 优质文献 相似文献 参考文献 引证文献Water-soluble resist for environmentally friendly lithography This paper describes an 'environmentally friendly,' water castable, water developable photoresist system. The chemically amplified negative-tone resist sys... ...
英文别名: NR9-6000PY negative tone photoresist中文名: 中文别名: CBNumber: CB413688750 分子式: 分子量: 0 MOL File: Mol file 化学性质 安全信息 用途 供应商 1 NR9-6000PY negative tone photoresist化学性质 安全信息NR9-6000PY negative tone photoresist性质、用途与生产工艺 NR9-6000PY negative tone ...
Negative photoresist for 157-nm microlithography: a progress report The design of 157 nm photoresists is a daunting task since air, water, and most organic compounds are opaque at this wavelength. Spectroscopic studies1 le... W Conley,BC Trinque,D Miller,... - 《Proceedings of Spie the Int...
Negative Tone Developer Compatible Photoresist Com 专利名称：Negative Tone Developer Compatible Photoresist Composition and Methods of Use 发明人：Anton J. deVilliers 申请号：US14751757 申请日：20150626 公开号：US20160011516A1 公开日：20160114 专利内容由知识产权出版社提供 摘要：Compositions and methods ...
SU-8 is a negative, epoxy type, near-UV photoresist. The resist has been specifically developed for ultrathick, high-aspect-ratio MEMS-type applications. I... G Ding - Micromachining & Microfabrication 被引量: 8发表: 2001年 Fabrication of high-aspect-ratio microstructure on metallic substrate ...
Vettiger, "High-Aspect-Ratio, Ultrathick, Negative-tone Near-UV Photoresist for MEMS Applications" Proceedings Of the 10th IEEE Intl. Work... H. Lorenz and M. Despont and N. Fahrni and J. Brugger and P. Vettiger and P. Renaud - 《Sensors & Actuators A Physical》 被引量: 898发表: ...
This causes key differences in key patterning properties, such as pattern collapse, adhesion, remaining resist, and photoresist etch selectivity. We have carried out fundamental studies to understand these new interactions between developer and remaining resist with negative tone develop systems. We have...