| 刻胶(英语:photoresist),亦称为光阻或光刻胶,是指经过深紫外光等光照或辐射后,溶解度发生变化的耐蚀刻薄膜材料,是工艺中的关键材料,主要应用于和的细微图形加工。光刻根据在显影过程中曝光区域的去除或保留可分为两种-正性光刻胶(positive photoresist)和负性光刻胶(negative photoresist)。#光刻
Positive Photoresists With positive photoresists, UV light strategically hits the material in the areas that the semiconductor supplier intends to remove. When the photoresist is exposed to the UV light, the chemical structure changes and becomes more soluble in the photoresist developer. These exposed...
The positive and negative photoresist technology combined microstrip line manufacturing method includes: 1), spinning a layer of positive photoresist on glass sheets or silicon slices as a device releasing sacrificial layer; 2), deposing a layer of Cu metal on the positive photoresist via the ...
negative working photoresist 负性感光胶 negative type photoresist 负型光致抗蚀剂 photoresist process 光致抗蚀工艺 photoresist film 感光耐蚀膜 removing of photoresist 去胶 positive photoresist 正性光刻胶,正性胶 photoresist flow 光致抗蚀通道 photoresist flaw 光蚀刻的伤痕 相似...
negative photoresist 网络 负向光阻; 负性光刻胶; 负光阻; 负光阻剂; 负性光致抗蚀剂
光阻有两种,正向光阻(positive photoresist)和负向光阻(negative photoresist)。 正向... 光阻剂是什么 像是光刻技术,可以在材料表面刻上一个图案的被覆层。 光阻有两种,正向光阻(positive photoresist)和负向光阻(negative photoresist)。 正向光... 它是高血压、高血糖高血脂最怕的水果, 三高 患者常吃降血压 ...
负光阻(Negative Photoresist):负光 阻遇到光会产生链结 (crosslinkage), 使遇光的 光阻结构加强而不溶 於显影剂, 负光阻在显 …www.docin.com|基于23个网页 更多释义 例句 释义: 全部,负性胶,负型光刻胶,负光阻 更多例句筛选 1. cyclized polyisoprene rubber negative photoresist; ultraviolet negative photo...
Negative Photoresists Developable in a Basic Water Developer: Negative Etch Resists Thickness Range: 0.5 - 200 micrometers Performance: No HMDS or adhesion promoters necessary Superior resolution capability. Short exposure time. Short development time. Superior temperature resistance of up to 180 degrees...
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2) water-soluble negative photoresist 水溶性负性光致抗蚀剂 3) negative 负性 1. The research progress ofnegativephotosensitive polyimide was summarized. 综述了负性光敏性聚酰亚胺的研究进展,着重介绍了商业上广泛使用的3种类型的光敏性聚酰亚胺的优缺点及对其的改性工作,并对这种材料的发展给予了展望。