优先权号 US19940299213优先权日 1994-08-31 分类号 G03F7/004 申请人信息 申请(专利权)人 CORNELL RESEARCH FOUNDATION, INC. 发明人FRECHET, JEAN M. J.;LEE, SZE-MING 地址-邮编- 代理人信息 代理机构 -代理人 - 摘要 A positive-tone photoresist is provided. The photoresist comprises a polymer, a...
The frozen film works as a positive‐tone photoresist. When the frozen PPaP is irradiated with light containing a wavelength much shorter than 300 nm, the ester structure of the exposed region is decomposed by photo‐chemically generated acid and dissolved in an alkaline solution. Furthermore, a...
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein Ris a C-Calkyl, cyclo alkyl, benzyl, phenyl, alkyl substituted cyclo alkyl, alkoxy ...
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R 1 is a C 1 -C 20 alkyl, cyclo alkyl, bensyl, phenyl, alkyl substituted cyclo ...
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R.sub.1 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, benzyl, phenyl, alkyl ...
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R.sub.1 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, bensyl, phenyl, alkyl ...
A positive-tone photoresist is provided. The photoresist comprises a polymer, a photoactive agent, and a dissolution inhibitor. The dissolution inhibitor comprises a compound of Formula I: ##STR1## wherein R.sub.1 is a C.sub.1 -C.sub.20 alkyl, cyclo alkyl, benzyl, phenyl, alkyl ...
Crosslinkable Positive-Tone Photoresist Comprising Polymers with Pendant Carboxyl Groups. JUI-HSIANG LIU,CHIH-HUNG SHI,WE-TIN CHEN. Journal of Applied Polymer Science . 2001JUI-HSIANG LIU, CHIH-HUNG SHI, WE-TIN CHEN.Crosslinkable Positive-Tone Photoresist Comprising Polymers with Pendant Carboxyl ...
Positive‐tone photoresist consisting of a multifunctional acrylate resin that can be patterned after photo‐crosslinkingdoi:10.1002/app.45871Hikaru SugitaYuka MiyashitaHiroyuki SuzukiShingo TakasugiNobuji MatsumuraMitsuyo YoshizawaJohn Wiley & Sons, Ltd...
Process for generating positive-tone photoresist imageHiroshi Ito