Advanced i-line lithography: processes for positive and negative patterning using the same acid hardening resistPractical, Experimental/ integrated circuit technologyphotolithography/ submicron gate fabricationsub-halfmicron processesi-line lithographynegative patterning...
We employed the 66-gap n-DEP microelectrode and the 4-gap p-DEP microelectrode, which were placed in the fluid channel. These microelectrode arrays were fabricated by a photolithography technique. A thin chrome film (100 nm thick) was deposited on a glass substrate by vacuum evaporation. A ...
The designed indium tin oxide electrode is developed by photolithography. The phase profiles are extracted from interference fringes obtained by use of polarization interferometry. Result: The phase profile maintains parabolic during focus tuning, a positive-negative tunable cylindrical liquid crystal lens ...
[0003] In the art of photolithography, a photographic material is made imagewise receptive to oily or greasy inks in the photo-exposed (negative-working) or in the non-exposed areas (positive-working) on a hydrophilic background. [0003] ...
The laser can be focused within the photosensitive resin, and by moving the voxel, three dimensional structures can be created. In earlier research, TPL is almost always used in combination with a negative photoresist, which is then called two-photon polymerization (2PP) [16]. The shape of ...
Thick film photolithography employing negative photoresists has been widely used in semiconductor fabrication. Typical resolution can range from 10˜50 μm lines and spaces at a film thickness of 10˜50 μm range. The circuit board requires a greater number of layers to accommodate the longer ...
Depending on the exposure energy used for holographic recording, bright or dark regions of the interference fringe can be chosen for the molecular-aligned region, analogous to positive- and negative-type photoresist processing in photolithography. In conjunction with simultaneously generated surface relief...
Reaction development patterning (RDP) was applied to poly(lactic acid) (PLA) to realize formation of a fine pattern by a photolithography process. The RDP of PLA using an aqueous solution of tetramethylammonium hydroxide (TMAH) as a developer gave a positive-tone fine pattern. It was also ...
A positive photosensitive composition comprises: (A) a compound generating an acid upon irradiation with one of an actinic ray and radiation; (B) a resin containing a monocyclic or polycyclic alicyclic hydrocarbon structure and increasing the solubility to an alkali developer by the action of an ...
There are two types of photoresist compositions, negative-working and positive-working. When negative-working photoresist compositions are exposed to radiation, the areas of the resist composition exposed to the radiation become less soluble to a developer solution while the unexposed areas of the phot...