Canon expects its nanoimprint lithography machine to ship this year, competing with ASML's EVU gear as economies around the world are keen to expand their chip production capacity on their home turfs, Hiroaki Takeishi, chairman and CEO at Canon, told theFinancial Timesthat the company plans to...
” said Kazunori Iwamoto, deputy group executive at Canon, in an interview last month at the Advanced Lithography Symposium. “The throughput has improved from [40 x300 mm is that 300mm wafers] wafers per hour in 2014 to 60 wafers per hour in 2016. What’s more, this platform will achiev...
The most basic form of nanoimprint lithography (NIL) requires a 1X mask, imprint fluid, and a substrate. This chapter provides a general description of the two prominent types of NIL: thermal and UV-NIL, a discussion of the inkjet technology used and requirements, and the review of ...
Canon Inc. -The company offers nanoimprint lithography systems such as semiconductor lithography equipment used to transfer circuit patterns onto a semiconductor chip. The market research and growth report includes detailed analyses of the competitive landscape of the market and information about key compan...
place at SK Hynix and in Kioxia’s (formerly Toshiba) fabrication facility and plans to begin mass producing 3D NAND flash using NIL by 2025. Canon also is building a new $357 million factory in Utsunomiya, north of Tokyo, to double the production of its lithography equipment, including NIL...
According to Canon, its nanoimprint lithography process is cheaper and sucks up less power than rival machines that use a more traditional optical approach. It does not require a light source, which in the latest photolithography equipment from companies such as Dutch giant ASML involves extreme ult...
J-FIL (referred to as S-FIL in early papers) stepper technology was conceived at the University of Texas at Austin, and then developed for semiconductor fabrication at Molecular Imprints Inc., a UT-Austin spin out; and is now part of Canon Corporation. Semiconductor lithography requirements ...
Imprint lithography is an effective and well-known technique for replication of nano-scale features. Nanoimprint lithography (NIL) manufacturing equipment utilizes a patterning technology that involves the field-by-field deposition and exposure of a low viscosity resist deposited by jetting technology onto...
EV Group (EVG) is a leading supplier of equipment and process solutions for the manufacture of semiconductors, microelectromechanical systems (MEMS), compound semiconductors, power devices and nanotechnology devices. Key products include wafer bonding, t
is more suitable for nanoimprint lithography. Bits & Chips reported that SK Hynix and Kioxia have tested Canon's nanoimprint lithography machines for years. Still, in May 2023,SK Hynix said there had been no discussion on the possible introduction or commercialization of the nanoimprint lithography....