Overlay in NIL is different from that in conventional optical lithography and next generation lithography such as EUV. In optical lithography, one can fix the gap between the mask and the wafer and then perform the alignment and the exposure. In NIL, one needs to do alignment while bringing ...
Nanoimprint steppers for semiconductor fabrication SV Sreenivasan discussed in section "EUV lithography". The strategy chosen for J-FIL is one where a template replica can pick up a small number of repeaters as long as the total defectivity stays below what is expected in memory applications. ...
The dissertation also gives in-depth characterization studies of applications to defect printability and mask performance in EUV lithography, nanoimprint alignment and inspection, and the design of optoelectronic mirrors.; A geometry to refractive index converter, SAM2TEM was developed to link TEM-PEST ...
Nanoimprint Foundry Singapore’s A*STAR’s Institute of Materials Research and Engineering (IMRE) and its partners have launched a new R&D foundry using nanoimprint lithography. The so-called Nanoimprint Foundry is a collaboration between several entities, such as IMRE, Toshiba Machines, EV Group, ...
Nanoimprint lithography is something like a room-temperature UV cure embossing process. The structures are patterned onto a template or mold using an e-beam or scanner, and then pressed into a resist on a substrate. After that, the template is removed. In semiconductor lithography, this is a ...
For more information visit www.intechopen.com 23 Nanoimprint Lithography Hongbo Lan1,2 and Yucheng Ding2 1School of Mechanical Engineering, Shandong University, 2State Key Laboratory for Manufacturing System Engineering, Xi'an Jiaotong University China 1. Introduction The Nanoimprint lithography (NIL) ...
23 Nanoimprint Lithography Hongbo Lan1,2 and Yucheng Ding2 1School of Mechanical Engineering, Shandong University, 2State Key Laboratory for Manufacturing System Engineering, Xi'an Jiaotong University China 1. Introduction The Nanoimprint lithography (NIL) is a novel method of fabricating micro/...
next-generation lithography -an outlook on euv projection and nanoimprintdoi:10.1515/aot-2017-0040Jan Van SchootHelmut Schift
Next-generation lithography – an outlook on EUV projection and nanoimprintNext-generationlithographynanoimprintLithography is dead - long live lithography! For ydoi:10.1515/aot-2017-0040JanASMLvanASMLSchootASMLHelmutASMLSchiftASMLDe GruyterAdvanced Optical Technologies...
B. Lin et al., "Successors of ArF water-immersion lithography: EUV lithography, multi-e-beam maskless lithography, or nanoimprint?" in J Micro/Nanolith. MEMS MOEMS, 2008.Burn J. Lin. Successors of ArF Water-Immersion Lithography: EUV Lithography, Multi-e-beam Maskless Lithography, or ...