Method for treating high aspect ratio process (HARP) film and method for manufacturing pre-metal dielectric (PMD) layerThe invention discloses a method for treating a high aspect ratio process (HARP) film. The method comprises the following steps of: performing primary plasma treatment on the ...
When formed through the first silicon oxide insulator layer within an advanced integrated circuit, such as a Pre-Metal Dielectric (PMD) layer formed of silicon oxide, a narrow line-width high aspect ratio via is typically formed in a location which allows interconnection of: (1) a narrow line...
To identify lncRNAs involved in regulating cell division, we performed two consecutive RNAi screens (screen A and B). Briefly, we transfected HeLa cells with the human Lincode small interfering RNA (siRNA) library targeting 2231 lncRNAs (Fig.1a; Supplementary Data1) and examined their effects usin...
High-aspect-ratio gaps are difficult to fill completely using conventional CVD techniques, which tend to have relatively poor gapfill abilities. One family of dielectric films that is commonly used to fill gaps in intermetal dielectric (“IMD”) applications, premetal dielectric (“PMD”) ...
The impact of polarization mode dispersion (PMD) is considered negligible in analysis. A 90° polarization and phase diversity homodyne coherent receiver is used to detect the signals, with no bandwidth limitation allowing for the ideal detection of in-phase and quadrature components of both the ...
and lower crosstalk amongst adjacent bits. RZ encoding also offers better immunity to fiber nonlinear effects and the effects of polarization mode dispersion (PMD), factors which can limit long-haul or high-rate transmission severely. Given the rising importance and popularity of this data format, ...
Purpose: a kind of method is arranged to by using two step tungsten bolt forming processes although the high aspect ratio of contact hole steadily fills a contact hole. Construction: the first PMD (pre-metal dielectric) (80) with first time contact hole is formed in the silicon substrate (...
The optional PMD cap layer is commonly 10 to 100 nanometers of a hard material such as silicon nitride, silicon carbide nitride or silicon carbide, formed on a top surface of the PMD main layer. Contacts 626 are formed through the PMD layer 624 to make electrical connections to the drift ...
5 100 TP-PMD, SONet, OC-3 (ATM), 100BASE-TX. The most popular for new data installations. [0015] Underwriter's Laboratory defines a level-based system, which has minor differences relative to the EIA/TIA-568's category system. For example, UL requires the characteristics to be measured ...
Knowledge of self-antigen reactivities of regulatory T cells (Treg) is an important aspect of understanding how they suppress inflammation. To determine whether TCR-MAP could deconvolute class II-restricted Treg specificities, we performed mouse peptidome screens using a Treg TCR (clone MNO) that rec...