High aspect ratio plasma etching of bulk lead zirconate titanate. 2006. USA: SPIE - The International Society for Optical Engineering.S. S. Subasinghe, A. Goyal, and S. A. Tadigadapa, "High aspect ratio plasma etching of bulk lead zirconate titanate," in MOEMS-MEMS 2006 Micro and ...
Single-Run Single-Mask Inductively-Coupled-Plasma Reactive-Ion-Etching Process for Fabricating Suspended High-Aspect-Ratio Microstructures high-aspect-ratio-structure (HARS)bulk micro-machiningdeep reactive ion etching (DRIE)suspended microstructuresIn this work, we present a single-run single-... Yao-...
, respectively;ε0is the vacuum permittivity; andID,VGandVTare the drain current, gate voltage and threshold voltage, respectively. The high aspect ratio of the generated lines facilitates the transfer of the patterns onto other materials using standard semiconductor techniques such as plasma etching...
Keywords:Plasma etch;Profile simulation;High aspect ratio contact;Etch profile 1.Introduction Plasma etching is extensively used in the fabrication of integrated circuits.Success of plasma etching often relies on good profile control of etched features.Profile control is a great challenge in etch process...
Effect of Wafer Temperature on High Aspect Ratio Hardmask Etching Fluorocarbon -based chemistries were used to study the effect of wafer temperature on the etch of high aspect ratio hardmasks composed of SiO 2 and SiN x ... S Lee,YC Tien,YW Chang - 《Plasma Chemistry & Plasma Processing》...
Etching method and recipe for forming high aspect ratio contact hole Disclosed is an etching method for forming a high aspect ratio contact hole. The plasma gas composition for the etching comprises Ar, a first fluorocarbon, Oand a second fluorocarbon, wherein the fluorine-to-carbon ratio of th...
etching of high aspect ratio features in si using s f 6 o 2 h br and s f 6 o 2 cl 2 plasma S Gomez,RJ Belen,M Kiehlbauch,... 被引量: 0发表: 0年 Fabrication of high-density Si and SixGe1x nanowire arrays based on the single step plasma etching process Dense arrays of ...
Plasma-etching on monolithic MOFs-based MIM filter boosted chemical sensing Jianxi Liu Li Feng Yadong Xu Nano Research (2024) Integrated metasurfaces for re-envisioning a near-future disruptive optical platform Younghwan Yang Junhwa Seong Junsuk Rho Light: Science & Applications (2023) Computa...
The DRIE-etching step was performed until a through-wafer etch was achieved. Figure 6e shows the resulting structure. The last steps were the removal of any unwanted materials such as the passivation layer by an oxygen plasma, the Al-capping layer by ICP etching, and the SiO2 hard masks by...
The modulated plasma etching process comprises a power modulation cycle having sequential power application steps that includes: applying a radio frequency (RF) signal to the plasma processing system at a first power level, applying the RF signal to the plasma processing system at a second power ...