Synonyms ARDE SynonymsARDE ARDE ARDEDefinition ARDE is the phenomenon of the etching rate related to the aspect ratio. The larger the aspect ratio, the lower the etching rate.DefinitionARDE is the phenomenon of the etching rate related to the aspect ratio. The larger the aspect ratio, the ...
In this study, the effect of using a neutral beam formed by low-angle forward reflection of a reactive ion beam on aspect-ratio-dependent etching (ARDE) has been investigated. When a SF6 Inductively Coupled Plasma and ion beam etching are used to etch poly-Si, ARDE is observed and the et...
The reactive ion etching of the polymer has been studied in CF4-O2, SF6, and N2 plasmas to understand the contributions of aspect-ratio dependent etching (ARDE), an anisotropic etch profiles, and the etch rate for one of low-k polymers, Divinyl bis-benzocyclobutene (BCB, silicon containing ...
aspect ratio dependent etching) AcronymDefinition ARDE Annual Review of Development Effectiveness (World Bank) ARDE Armament Research and Development Establishment (Pune, India) ARDE Alianza Revolucionaria Democrática (Spanish: Democratic Revolutionary Alliance; Nicaragua) ARDE Acción Republicana Democrática ...
Define aspect ratios. aspect ratios synonyms, aspect ratios pronunciation, aspect ratios translation, English dictionary definition of aspect ratios. n. 1. The width-to-height ratio of an image or of the area used to display an image. Most widescreen tel
The Si nanopillars with high aspect ratio were fabricated by dry-etching the thin SiO(2)-covered Si substrate with a rapidly self-assembled Ni nanodot patterned mask. Aspect-ratio-dependent ultra-low reflection and anomalous luminescence of Si nanopillars are analyzed for applications in all-Si ba...
Aspect ratio (disambiguation) Aspect Ratio Control Aspect Ratio Convert aspect ratio dependent etching Aspect Ratio Information Aspect Ratio Value aspect ratios aspect ratios aspect ratios Aspect Source Flag Aspect, Biological Aspect, Geographic Aspect, Verbal Aspect-Oriented and Model-Driven ▼Complete...
An ultrasmall, 60nm-diameter, 2um-deep contact hole pattern of BPSG film was successfully fabricated using a poly-Si mask and a magnetically enhanced reactive-ion-etching system. Significantly weaker dependence of etch rate on aspect ratio(AR) was obtained up to AR=30, showing that the energet...
United States Patent US9257300 Note: If you have problems viewing the PDF, please make sure you have the latest version ofAdobe Acrobat. Back to full text
Metal-assisted chemical etching for very high aspect ratio grooves in n-type silicon wafers.doi:10.1088/0960-1317/24/12/125026Metal-assisted chemical etching (MACE) is an inexpensive, simple method for etching silicon structures, including the etching of high aspect ratio grooves. We improve on ...