In one implementation, a semiconductor plasma etching process includes first etching material from a substrate and forming an undesired residue at least partially over the substrate during the first etching. After the first etching and before subsequently depositing any material over the substrate, the...
The semiconductor device manufacturing process using the plasma etching method, using a variety of gases is converted into a plasma state, and the mask pattern thereon wafer ion collision and chemical reaction, hydrogen iodide (HI) as the main etching gas, etching of the silicon substrate material...
The present disclosure relates to semiconductor manufacturing, in particular to a real-time method for qualifying the etch rate for plasma etch processes. ... JH Sato,BD Hennes,YC Kimmel 被引量: 0发表: 2018年 加载更多研究点推荐 sputter etching Process Diagnosis component identification Wireless Sen...
The resulting pulsed plasma process output (etching rate, uniformity, damage, etc) is compared, whenever possible, to that of CW plasma, under otherwise the same or similar conditions. (topical review) 展开 关键词: General or Review/ argon chlorine reviews sputter etching/ etching rate pulsed ...
Plasma--等离子体 一种由电离微粒组成的导电气体,使用化学或物理轰击过程,用等离子体来刻蚀不需要的材料。等离子刻蚀在反响堆中进展,反响堆可以是桶形或平面形。 PlasmaEtching--等离子刻蚀 将射频能量加到气态化学制品上,产生辉光放电。这个辉光放电包括活性组分〔原子、基、离子〕,它们与需要去除的材料发生化学反响,化...
Plasma is a state of matter in which energy is higher than gas. In general, there are three states of matter: solid, liquid, and gas. As the temperature rises, the solid becomes liquid and becomes gas.
Plasma deposition andetchingreactors1761When plasma processes are operated at high pressures (greater than about 0.15 torr) the pro—cesses are mainly discharge—current dependent. However, it is difficult to measure dischargecurrent directly in a quantitative way, so it is advisable to use automatic...
PURPOSE: To decrease the dispersion of etching speed inside a wafer by controlling the etching speed of each part of a semiconductor substrate. CONSTITUTION: On the occasion of plasma-etching a surface of a semiconductor substrate 1 covering it with an etching mask having a large number of openi...
process, ranging from wet processes, chemical mechanical planarization, plasma etching, deposition, lithography, testing, assembly, packaging, and more. Each stage of the fabrication process offers its own set of challenges: from extremely high temperatures, to exposure to highly aggressive chemicals, ...
摘要: PURPOSE: To provide a low cost wafer dummy in plasma etching without such a difficulty as dropping of powder material by solving difficulty in the prior art and making possible high purity processing.收藏 引用 批量引用 报错 分享 文库来源 求助全文 SEMICONDUCTOR WAFER DUMMY, ITS ...