Lin,Q. Properties of Photoresist Polymers[A].New York:Springer-Verlag,2007.965.Lin, Q. Properties of Photoresist Polymers. In Physical Properties of Polymers Handbook; Mark, J.E., Ed.; Springer: New York, NY, USA, 2007; pp. 965-979. ISBN 978-0-387-31235-4....
-The Effects of Electron Beam and g-Irradiation on Polymeric Materials. -Flammability. -Thermal-Oxidative Stability and Degradation of Polymers. -Synthetic Biodegradable Polymers for Medical Applications. -Biodegradability of Polymers. -Properties of Photoresist Polymers. -Pyrolyzability of Preceramic ...
Characterization of Water-Soluble Acrylic Resist Using a Novel Photoinitiator. Water-soluble photoresists composed of base polymers, a trifunctional epoxy acrylate monomer DA-314 and MBS have also evaluated. The resist using poly... K Kojima,M Itoh,H Morishita,... - 《Journal of Photopolymer Scie...
New Development, Experimental/ electron beam effects photoresists polymers radiation chemistry/ preparation properties polysiloxane electron resist polymethylcyclosiloxane siliceous film patterns diffusion barriers passivating layers transistors sensitivity controlled condensation introducing vinyl groups chemical changes ...
Negative photoresist compositions for the formation of thick films, photoresist films and methods of forming bumps using the same A negative photoresist composition is used for the formation of thick films and includes (A) a novolak resin, (B) a plasticizer, (C) a crosslinking agent and (D)...
- Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques 被引量: 0发表: 2018年 Creating photoresist composition by applying to substrate surface coating of DNA polymers capable of self-assembling into photonic crystal, allowing DNA po... Embodiments of the present invention ...
Polyimides rank among the most heat-resistant polymers and are widely used in high temperature plastics, adhesives, dielectrics, photoresists, nonlinear op... DJ Liaw,KL Wang,YC Huang,... - 《Progress in Polymer Science》 被引量: 797发表: 2012年 Novel Infinite Three‐Dimensional Networks with...
- 《Journal of Macromolecular Science Part B》 被引量: 62发表: 1987年 Semiempirical profile simulation of aluminum etching in a Cl2/BCl3 plasma A semiempirical profile simulator to predict topographic evolution during Cl/BClplasma etching of photoresist patterned Al lines has been developed. Given ...
Synthesis and photocuring properties of UV-curable/alkali-soluble acrylic resin An alkali-soluble photosensitive prepolymer was synthesized as photoresist by one-step process.hydroxyethyl acrylate was reacted with phthalic anhydride at... Q Meng,CH Shen,Y Wang,... - 《Journal of Functional Materials...
Specific examples of such resins include styrene or styrene derivative polymers, styrene copolymers, polymethylmethacrylate, polybutylmethacrylate, polyvinyl chloride, polyvinyl acetate, polyethylene, polypropylene, polyesters, epoxy resins, epoxy polyol resins, polyurethane, polyamide, polyvinyl butyral, polyacry...