PhotoresistsPhotoconductive polymersPreceramic materialsThis review article covers the synthesis and properties of organic polysilanes having SiSi sequences ... J Chojnowski,M Cypryk,J Kurjata - 《Progress in Polymer Science》 被引量: 184发表: 2003年 加载更多0...
The polymer is of a controlled molecular weight and a narrow molecular weight distribution and has a high degree of resolution and development, meeting the requirements of resist materials. The method allows for simple preparation of such polymers....
In this paper, we report the optimization results of SU-8 EPON-based photoresist (PR) polymerization and its possible microfluidic and MEMS applications. F... J Zhang,KL Tan,HQ Gong - 《Polymer Testing》 被引量: 269发表: 2001年 Polymerization optimization of SU-8 photoresist and its applicat...
methacrylate polymerIn this paper we review the design and performance of ArF resists developed from various polymer platforms. Inadequate etch performance of early ArF acrylate platforms necessitated the development of new etch resistant platforms, in terms of both etch rate and etch uniformity. Two ...
Polymer selection and critical dimension (CD) pattern uniformity across the wafer are key parameters for the nanoimprint lithography technique. This nanotechnology requires polymers having a low glass transition temperature (Tg) combined with a good etch resistance. The printing of a commercial E-beam...
Disclosed are a light absorbent agent polymer for organic anti-reflective coating which can prevent diffused reflection of lower film layer or substrate an... JC Jung,K Kong,SK Kim 被引量: 0发表: 2005年 Apparatus of coating the photoresist layer and photolithography method using the same An ap...
Direct projection on dry-film photoresist (DP(2)): do-it-yourself three-dimensional polymer microfluidics. Zhao S, Cong H, Pan T (2009) Direct projection on dry-film photoresist (DP(2)): do-it-yourself three-dimensional polymer microfluidics. Lab Chip 9......
and X.H. wrote the paper. All authors participated in the discussion and correction of the paper. Corresponding authors Correspondence to Cuifang Kuang, Hong Xu or Xiangming He. Ethics declarations Competing interests The authors declare no competing interests. Peer review Peer review information ...
- 《Polymer Engineering & Science》 被引量: 1发表: 2010年 New Chemically Amplified Positive Photoresist with Phenolic Resin Modified by GMA and BOC Protection In this paper, a chemically amplified (CA) i-line photoresist system is described including a phenolic resin modified with glycidyl ...
reviewThe germanium selenide/polymer bilevel photoresist system is reviewed covering the literature up to mid 1984. The review is oriented towards the prospects of germanium selenide as a high resolution photoresist for VLSI production and covers the preparation of the lithographic product and its ...