Entire wafer nanoimprint lithography machine of the present invention has a simple structure, adaptability, ease of operation, low manufacturing cost and high reliability, can be used in LED graphic, manufacturing microlenses, microfluidic devices, Especially suitable for the manufacture of low-cost and...
Canon expects its nanoimprint lithography machine to ship this year, competing with ASML's EVU gear as economies around the world are keen to expand their chip production capacity on their home turfs, Hiroaki Takeishi, chairman and CEO at Canon, told theFinancial Timesthat the company plans to...
For more information visit www.intechopen.com 23 Nanoimprint Lithography Hongbo Lan1,2 and Yucheng Ding2 1School of Mechanical Engineering, Shandong University, 2State Key Laboratory for Manufacturing System Engineering, Xi'an Jiaotong University China 1. Introduction The Nanoimprint lithography (NIL) ...
Canon has shipped its first ever nanoimprint lithography machine to the Texas Institute for Electronics for use in its R&D labs. The tech, we're told, can produce 5nm circuit patterns using a mold, rather than light, to transfer them to a semiconductor wafer. In October last year, the Jap...
Nanoimprint lithography (NIL) is more than a planar high-end technology for the patterning of wafer-like substrates. It is essentially a 3D process, because it replicates various stamp topographies by 3D displacement of material and takes advantage of the bending of stamps while the mold cavities...
The Nanoimprint lithography (NIL) is a novel method of fabricating micro/nanometer scale patterns with low cost, high throughput and high resolution (Chou et al., 1996). Unlike traditionally optical lithographic approaches, which create pattern through the use of photons or electrons to modify the...
* Nanonex Announces the Shipment and Installation of an Innovative Nanoimprint Lithography System for Fully Automated Manufacturing * Founder Prof. Stephen Chou, will give tutorial on nanoimprint at IEEE Nano 2013 * Nanonex Delivers Nanoimprint Tool NX-B200 to Swinburne University of Technology, Australia...
We demonstrate the nanoimprint lithography (NIL) technique with sub 100 nm resolution, on 6 in. Si substrates. The pattern transfer is performed using a specially designed NIL machine optimized to achieve a very high degree of parallelism between stamp and substrate. The stamp is made with the ...
Nanoimprint lithography (NIL) is a method of fabricating nanometer scale patterns. It is a simple nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist and subsequent processes. The imprint resist is typically a monom...
Design and Performance of a Step and Repeat Imprinting Machine Molecular Imprints, Inc. (MII) has developed the Imprio~(TM) 100, which is the first commercial step and repeat imprint lithography system with field-to-fi... I Mcmackin,P Schumaker,D Babbs,... - Microlithography 被引量: 56...