高k介质材料(High-k dielectric materials)指的是介电常数(或称相对介电常数)较高的材料。介电常数是衡量材料对电场响应的能力的一个重要物理量,简而言之,它表示材料在电场作用下的电容储存能力。 1. 什么是…
高K介质 (High-k Dielectric)和替代金属栅 (RMG)工艺 2007年,Intel公司宣布在 45nm CMOS 工艺节点上成功地使用高k氧化铪基(Hf-oxide Based)介质和金属栅工艺,可以显著减少栅介质泄漏电流和增加栅导电能力。 但高k氧化铪基栅介质较易被源漏退火步骤的热过程引起结晶化,导致较大的泄漏电流,因此高k介质金属栅模块...
...举了目前Intel所面临的挑战,包括寻找一种合适的高介电材料(high-k dielectric);采用性能相当的NMOS元件来生产化合物… guba.eastmoney.com|基于7个网页 3. 高介电常数 高致密性与高介电常数(High-k Dielectric)的特性,进而能提升施加至控制电极层120、 122、124、126、128、150的电压范围 … ...
1. Introduction The search for high dielectric constant (high-k) gate dielectric materials for ?eld-effect transistor-enabled (FET) applications has stimulated important research activities in both conventional and unconventional electronics. Although it is not the focus of this Review Article, high-k...
The continuous shrinking of device dimensions in order to follow Moore’s Law makes SiO2 almost meets its physical limit in thickness, hence gate insulators with higher dielectric constant (high-k) to maintain sufficient capacitance are necessary for MOS
I. INTRODUCTIONDouble-gate (DG) metal oxide semiconductor field effect transistor (MOSFET) and related multiple-gate device architectures are nowadays widely identified as one of the most promising solutions for Nanoscale integration [7].With one extra gate, the gate to channel coupling is doubled ...
1、High-k与Low-k的分析 近十年来CPU业者每发表1款新主打CPU,就会顺带标榜该芯片所用的制程技术,最初只标榜尺寸缩密性制程,而近五年来更是强调各种新材质性制程,倘若不去了解新材质制程的意义,那么也将愈来愈不了解新CPU的价值意义过去IBM微电子发表Low k Dielectric(低介电质绝缘,或称:低介电常数绝缘)...
characterization of high-k gate stacks in metal-oxide-semiconductor capacitors 热度: Dielectric Breakdown in a 45 nm High-K Metal Gate Process Technology 热度: 相关推荐 AdvancedMetalGate/High-KDielectricStacksfor High-PerformanceCMOSTransistors RobertChau ComponentsResearch,LogicTechnologyDevelopment,Intel...
1.2Low-K材料的选择: 要谈论low-k制程技术,就免不了要谈论copper interconnect技术,因为copper interconnect与low k dielectric是相辅相成的,前者用来强化线路的传导性,后者用来降低线路间的绝缘性。 由于半导体制程的不断进步,集成电路的尺寸越来越小、电路越来越密,同时工作频率越来越快,在改到GHz频率、线路宽度小于...
Metal Electrode/High-k Dielectric Gate-Stack Technology for Power Management. High-k dielectrics have been intensively investigated during the last decade, and their performance as a gate dielectric has been improved to the level of ... BH Lee,SC Song,R Choi,... - 《IEEE Transactions on Elec...