Chen, Q.T. Zhao, Mobility enhancement and gate-induced-drain-leakage analysis of strained-SiGe channel p-MOSFETs with higher-j LaLuO3 gate dielectric, Chin. Phys. Lett. 31 (2014) 1-4. 016101.Shu Y, Sen H, Hongwei C, Chunhua Z, Qi Z, Schnee M, et al. AlGaN/GaN MISHEMTs with ...
Gate-induced drain leakage current enhanced by plasma :栅极感应漏极泄漏电流的等离子体增强泄漏,漏极,电流,栅极漏电流,gate,drain,漏电流,Drain,漏极泄漏,漏极感应 文档格式: .pdf 文档大小: 90.33K 文档页数: 3页 顶/踩数: 0/0 收藏人数:
1888 IEEETRANSACTIONSONELECTRONDEVICES,VOL.40,NO.10,OCTOBER1993 Gate-InducedDrainLeakageCurrentin MOSDevices V.NathanandN.C.Das Abstract-Thegate-induceddrainleakagecurrent(GIDL)intypical n-channelMOSFET'siscalculatedfordirectandindirecttunneling fromthevalencebandtotheconductionbandofsilicon,aswellas tunneling...
Discusses the correlation between gate-induced drain leakage (GIDL) current and plasma charging damage for the p-metal-oxide semiconductor field-effect transistors (p-MOSFET). Background of GIDL; Experimental setup; Subthreshold characteristics for pMOSFETs with different antenna area ratio in the same...
Gate-induced drain leakage (GIDL) current is investigated in single-gate (SG) ultra-thin body field effect transistor (FET), symmetrical double-gate (DG) FinFET, and asymmetrical DG metal oxide semiconductor field effect transistor (MOSFET) devices. Measured reductions in GIDL current for SG and...
The gate-induced drain leakage current (GIDL) in typical n-channel MOSFETs is calculated for direct and indirect tunneling from the valence band to the conduction band of silicon, as well as tunneling from the conduction band minimum of silicon to the interface traps, and compared to experimental...
nMOSFETThe influence of gate voltage VG on gate induced drain leakage (GIDL) current is studied in LDD nMOSFET with a gate oxide of 1.4nm and a channel length of 100nm. It is found that the split phenomena of ln(Id/(VDG-1.2))-1/(VDG-1.2) curves under different VG values occurs, ...
A semiconductor integrated circuit device and method for reducing gate induced leakage current associated with circuits of the semiconductor electrical device, such as a semiconductor integrated circuit memory device. During a standby mode, a voltage supplied to a plurality of circuits is reduced so as...
专利名称：GATE INDUCED DRAIN LEAKAGE REDUCTION 发明人：ABDELFATTAH, Khaled 申请号：US2016/046872 申请日：20160812 公开号：WO2017/034834A1 公开日：20170302 专利内容由知识产权出版社提供 专利附图：摘要：Exemplary embodiments of the present disclosure are related to reducing, and possibly preventing, gat...
The back-gate bias-dependent gate-induced drain leakage (GIDL) and gate current models of ultrathin body (UTB) silicon-on-insulator (SOI) MOSFETs are proposed. From the experimental data, the GIDL current depends on the back bias due to the electric field change in the channel/drain junction...