sputter etching/ focused ion beam millingion beam etchingmasklesscompact microfocused beam columnhigh brightness metal ion sourcecomputer-controlled scan generatorfabricationopto-electronic devices/ A8160 Corrosion, oxidation, etching, and other surface treatments B2550E Surface treatment (semiconductor ...
A system for the investigation of maskless ion beam milling is described which is based on a compact microfocused ion beam column incorporating a high brightness metal ion source. Images of the specimen can be obtained by collecting either secondary electrons or scattered ions. Points on the speci...
DualBeam仪器系列包括多款FIB-SEM聚焦离子束扫描电子显微镜(双束电镜)产品,适用于自动结构分析、TEM 样品制备以及纳米原型设计。联系我们Focused ion beam scanning electron microscopy 学术界和工业界的科学家和工程师不断面临着需要对各种样品和材料进行高度局部表征的新挑战。提高这些材料质量的持续动力意味着常常需要...
求翻译:focused ion beam (FIB) milling,5,6) and also obtained by是什么意思?待解决 悬赏分:1 - 离问题结束还有 focused ion beam (FIB) milling,5,6) and also obtained by问题补充:匿名 2013-05-23 12:21:38 聚焦离子束(FIB)铣削,5,6),也获得由 匿名 2013-05-23 12:23:18 匿名 2013...
The development of xenon plasma focused ion-beam (XePFIB) milling technique enables site-specific sample preparation with milling rates several times larger than the conventional gallium focused ion-beam (GaFIB) technique. As such, the effect of higher beam currents and the heavier ions utilized ...
Modification of semiconductor laser diodes by focused ion beam millingExperimental/ aluminium compoundselectroluminescencegallium arsenideIII-V semiconductorsion microscopyridge waveguidessemiconductor laserssputter etchingsputteringwaveguide lasers/ semiconductor laser diodes...
Focused ion beam (FIB) milling is one of the fastest and accurate processes for the micro- and nanofabrication of devices. There is a need of making micro- and nanoscale components from cemented carbide material due to its favorable properties of high hot hardness and wear resistance. These ...
Focused-ion-beam milling is used to fabricate nanostencil masks suitable for the fabrication of magnetic nanostructures relevant for spin transfer torque studies. Nanostencil masks are used to define the device dimensions prior to the growth of the ...
Automated drift-corrected nano-pillar milling produced with multiple beam currents and Autoscript Software. Horizontal field width = 10 µm. 3D quantitative analysis of Li-ion battery graphite anode. The data has been acquired using a Thermo Scientific Helios 5 Laser PFIB System, followed by reco...
Beam-induced deposition of different materials can be combined with FIB milling without the need for additional aligning lithography steps; patterns can be directly added to deposited structures or existing patterns can be modified. The final patterned substrates are immediately available for further ...