CONSTITUTION:In an ECR plasma CVD device, which is provided with a microwave generating means, a microwave transmitting means (a waveguide) 11, a vacuum container 13, main solenoids 14, auxiliary solenoids 18 for generating a line of magnetic force which controls a plasma transferring path so ...
The effect of nitrogen incorpo- ration in DLC films deposited by ECR Microwave Plasma CVD [J]. Appl Surf Sci,2014,314:46.Z. Seker, H. Ozdamar, M. Esen, R. Esen, H. Kavak, The effect of nitrogen incorporation in DLC films deposited by ECR Microwave Plasma CVD, Appl. Surf. Sci. ...
Yttrium oxide (Y 2 O 3 ) thin films are deposited by microwave electron cyclotron resonance (ECR) plasma assisted metal organic chemical vapour deposition (MOCVD) process at a substrate temperature of 350°C using indigenously developed metal organic precursors (2,2,6,6-tetra methyl-3,5-heptan...
1) method of ECR plasma CVD 电子回旋共振等离子体化学汽相沉积法2) electron cyclotron resonance-microwave plasma chemical vapor deposition(ECR-MPCVD) 电子回旋共振-微波等离子体化学气相沉积3) ECR-PECVD 电子回旋共振等离子体增强化学气相沉积4) Microwave Electron Cyclotron Resonance Plasma Chemical Vapor ...
2) microwave ECR CVD 微波ECR-CVD3) microwave-ECR 微波-ECR 1. We obtained the SiCN thin films by microwave-ECR plasma enhanced unbalanced magnetron sputtering technique) studied the chemical structure and mechanic properties. 本文采用微波-ECR等离子体增强非平衡磁控溅射技术制备SiCN薄膜,并对薄膜的...
Thin-film transistors (TFTs) were fabricated on polyimide and glass substrates at low temperatures using microwave ECR-CVD deposited amorphous and nanocrystalline silicon as active layers. The amorphous Si TFT fabricated at 200 /spl deg/C on the polyimide foil had a saturation region field effect ...
为提高a -Si∶H薄膜的沉积速度 ,还重点介绍了一种新的微波电子回旋共振等离子体CVD(MWECR -CVD)技术 。5) Electron cyclotron resonance microwave plasma 电子回旋共振微波等离子体 例句>> 6) ECR sputtering method 电子回旋共振微波等离子体溅射补充资料:电子自旋共振(见电子回旋共振) 电子自旋共振(见电子回旋...
CVD是沉积薄膜的一种新型技术,在低温低压下能够形成高密度、高 电离度的等离子体,使气体很容易实现化学反应而沉积薄膜。该系统制备薄膜的 结构对反应气体具有依赖性。近几年,CVD技术中引入三氟化硼(BF3)气体, 制备出微米级厚度的高质量c.BN薄膜,并能实现低衬底偏压的薄膜沉积。实验 ...
The SiO2 films were prepared by electron cyclotron resonance(ECR) plasma diffusion and chemical vapor deposition(CVD) method. In an oxygen plasma generated by ECR source, these reactive ions can be controlled by adjusting the microwave power, O2 flow rate, self-DC bias, and source to sample di...
High Performance S/C band SAW Microwave Delay Line 高性能S、C波段声表面波微波延迟线 9. The Preparation of Cubic Boron Nitride Thin Films by ECR CVD System and Study of Their Properties; ECR CVD制备立方氮化硼薄膜及性能研究 10. Establishment of the Bottled Pasteurized Milk Supply Chain Based on...