dry etching 美 英 un.干腐蚀;干刻蚀 网络乾蚀刻;乾式蚀刻设备;干法刻蚀 英汉 网络释义 un. 1. 干腐蚀 2. 干刻蚀
dry developing 乾式显影 dry etching system 乾式蚀刻系统 Dry ice 乾冰 ... www.zftrans.com|基于15个网页 2. 干法刻蚀设备 动态散射型液晶显示器... ... [液晶词典] 干膜( dry firm resist) [液晶词典] 干法刻蚀设备( dry etching system) ... www.fpdisplay.com|基于4个网页 3. 乾蚀刻机 安内华...
PURPOSE:To achieve a high speed, a high selectivity, a low contamination, and a low damage of a dry etching for forming a contact hole at a silicon oxide interlayer insulation film. CONSTITUTION:A wafer is temperature-controlled to 50 deg.C or less by using a saturation or unsaturated ...
09_-_dry_etching Dry Etching
In a method for dry-etching a multilayer film which contains a titanium nitride film and which is formed on a silicon dioxide layer, after the multilayer film is etched by using a Cl/BCl/CHFgas while using a resist as a mask, but before ... M Izawa - US 被引量: 901发表: 2001年 ...
集成电路制造技术第五章(刻蚀)-干法dry etching
Dry Etching Dry Etching Prof. Tianhong Cui, Mechanical Engineering ME 8254 Dry Etching Overview z What is dry etching?–Material removal reactions occur in the gas phase.z Types of dry etching –Non-plasma based dry etching –Plasma based dry etching z Why dry etching?z Development of dry ...
Dry etching refers to the removal of material, typically a masked pattern of semiconductor material, by exposing the material to a bombardment of ions (usually a plasma of nitrogen, chlorine, and boron trichloride) that dislodge portions of the material from the exposed surface. ...
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给出Wet Etching湿法刻蚀的定义,并从各向同性和各向异性角度对Wet Etching湿法刻蚀进行分类。给出Dry Etching干法刻蚀的定义,并从物理和化学角度对Dry Etching干法刻蚀进行分类,并说明了反应离子刻蚀在Dry Etching干法刻蚀中的地位。 文档格式: .ppt 文档大小: ...