PURPOSE:To correct the uniformity of etching effect over the whole surface of a wafer according to the dimensions of the wafer and to inhibit production of excessive etching species for preventing the contamination of inner walls of a reaction chamber, by properly selecting the diameter and the ...
Industrial Chiller for Semiconductor Dry Etching Equipment US$5,320.00-6,899.00 1 Piece (MOQ) Product Details Customization: Available After-sales Service: 1 Year Warranty: 1 YearContact Supplier Chat Beijing WIIP Co. Ltd. Manufacturer/Factory, Trading Company ...
Conductor Etch System M-8000 Series is utilized for hard mask and silicon etching for 32nm and beyond. Hitachi High-Tech developed new process flows, such as double patterning and new material etch processes such as high-k dielectric/metal gate through JDP (Joint Development Program) with device...
To provide a dry etching method by which the ignitability and stability of a plasma in a low pressure region, that are required for formation of vertical etching shape with good reproducibility, can be secured in a dry etching treatment stage for wafer, and also to provide an equipment for ...
To provide a dry etching method by which the ignitability and stability of a plasma in a low pressure region, that are required for formation of vertical etching shape with good reproducibility, can be secured in a dry etching treatment stage for wafer, and also to provide an equipment for ...
PROBLEM TO BE SOLVED: To prevent a foreign matters from generating and improve dimensional accuracy of wiring, by etching by supplying a subject with oxygen and carbon so as to have the ratio of the number of oxygen atoms to the number of carbon atoms at a specific limited value. ;SOLUTION...
PURPOSE: A load lock chamber of dry etching equipment for manufacturing a semiconductor device is provided to prevent a periphery of an outer door of an etching chamber from being corroded by being exposed to reaction by-product such as hume generated in the etching chamber. CONSTITUTION: An out...
摘要: PROBLEM TO BE SOLVED: To judge the end point of dry etching without error, while avoiding time delays and deterioration of judging precision.收藏 引用 批量引用 报错 分享 文库来源 求助全文 END POINT JUDGING METHOD OF DRY ETCHING AND DRY ET 优质文献 ...
The NA-1500 dry etching system provides stable transfer and processes without abnormal discharge, according to Ulvac. Japanese vacuum equipment manufacturer Ulvac has unveiled the NA-1500 dry etching system for 600mm advanced packaging substrates, providing for uniform Descum and Ti etching processes. ...
发明名称: MICROWAVE-EXCITED DRY ETCHING EQUIPMENT 发明人: OKAMOTO SHINJI 申请人: 申请日期: 1997-09-26 申请公布日期: 1999-04-13 代理机构: 代理人: 地址: 摘要: 二、法律状态 暂无信息 三、权利要求 暂无信息 四、说明书暂无信息 打开APP,查看更多专利的权利要求、说明书更多...