Utilizing chemical dry etching for forming rounded corner in shallow trench isolation process The present invention is to utilize chemical dry etching technique to form a rounded corner in a shallow trench isolation process. After finishing the etching of the shallow trench, the present invention ...
1. A method of radiation induced dry etching of a substrate having a layer of a first material superposed on a second material comprising: (a) mounting said substrate in a reaction chamber containing a reactive gas, whereby said first material and said reactive gas form a first solid reaction...
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;CONSTITUTION: Etching gas 11 consisting of CF<Sub>4</Sub> gas, 0<Sub>2</Sub> gas and CH<Sub>3</Sub>OH gas is excited in a discharge part 10 to generate neutral active species, these active species are transported to an etching chamber 13 and an SiN<Sub>x</Sub> layer of a ...
Specifically, the opening is formed by a conventional dry etching process including, but not limited to: reactive-ion etching (RIE), plasma etching and ... TJ Dalton,SM Gates,JC Hedrick,... 被引量: 0发表: 2002年 Air-drying chemical corrosion resistant unsaturated resin and production process...
CONSTITUTION:A substrate 11 to be subjected to chemical dry etching is set in a vacuum vessel 1. A main valve 2a and an auxiliary valve 6 are closed, and a main valve 2b is opened to roughly evacuate the vessel 1 to a specified pressure by the preprocess evacuation line and to remove ...
The present invention is to utilize chemical dry etching technique to form a rounded corner in a shallow trench isolation process. After finishing the etching of the shallow trench, the present invention utilizes an isotropic etching step, which is a chemical dry etching step of a high silicon ...
Device for chemical dry etching of integrated circuits Apparatus for dry chemical etching caused by ion bombardment of a substrate placed in a vacuum chamber. The substrate is in contact with an electrode, connected to a high frequency bias voltage source having one terminal connected to a g......
EVACUATION DEVICE FOR CHEMICAL DRY ETCHING