virtual metrologyThe objective of this paper is to present the utilization of information produced during plasma etching for the prediction of etch bias. A plasma etching process typically relies on the concent
Outline of the Presentation Scheme of Data Processing Etch Process / Recording spectra Offline Analysis Data Mining via Ridge Regression / define Areas Plasma Preprocessing of OES Data On-line Application of Model Applying Model to APC Trend Building Model via Forward Regression DTml_pred = f(OES_A...
The latest version of the Equipment Intelligence® Data Analyzer was designed for plasma-enhanced chemical vapor deposition (PECVD) and atomic layer deposition (ALD) chambers. It accommodates differences in the wafer flow scenarios in PECVD/ALD chambers in relation to etch chambers (multi-pedestal ...
sputter etching/ real-time virtual metrologyplasma etch controlPlasma etch is a semiconductor manufacturing process during which material is removed from the surface of semiconducting wafers, typically made of silicon, using gases in plasma form. A host of chemical and electrical complexities make the ...
Robust virtual metrology of plasma etch tools using Growing Structure Multiple Models Systems with Dynamic Partial Least Squares modelsTraditional semiconductor manufacturing factories have relied on run-to-run process control with external metrology. Only the most critical processes have metrology on every ...
Macgearailt, "Gaussian process regression for virtual metrology of plasma etch," in Signals and Systems Conference (ISSC 2010), IET Irish, pp. 42-47, 2010.Shane Lynn, John Ringwood, and N. Macgear- ailt. Gaussian process regression for virtual metrology of plasma etch. In Signals and ...
ABSTRACT Robust virtual metrology of plasma etch tools using Growing Structure Multiple Models Systems with Dynamic Partial Least Squares models Bo Lua, John Stuberb, Thomas F. Edgara a McKetta Department of Chemical Engineering, b Texas Instruments Inc. The University of Texas at Austin, 1 ...
Plasma etchAs a useful tool for process control in a high volume semiconductor manufacturing environment, virtual metrology for the etch rate in a plasma etch process is investigated using optical emission spectroscopy (OES) data. Virtual metrology is a surrogate measurement taken from the process ...
Real-time Virtual Metrology and Control of Plasma Electron Density in an Industrial Plasma Etch ChamberShane A LynnNiall MacgearailtJohn Ringwood
A stringent manufacturing process control is important to achieve reliable process control in nanoscale semiconductor manufacturing processes. Based on the advanced process control mechanisms in advanced semiconductor manufacturing, virtual metrology (VM) can be used to reduce the time and cost incurred in...