virtual metrologyThe objective of this paper is to present the utilization of information produced during plasma etching for the prediction of etch bias. A plasma etching process typically relies on the concentration of electrically activated chemical species in a reaction chambers over time, depending ...
Plasma etch is a complex semiconductor manufacturing process in which material is removed from the surface of a silicon wafer using a gas in plasma form. As the process etch rate cannot be measured easily during or after processing, virtual metrology is employed to predict the etch rate instantly...
Virtual metrology for prediction of etch depth in a trench etch process the approach and results towards the development of a virtual metrology algorithm for the prediction of trench depth after a complex dry-etch process are ... G Roeder,M Schellenberger,L Pfitzner,... - IEEE 被引量: 0发...
Virtual metrology modeling for plasma etch operations IEEE Transactions on Semiconductor Manufacturing, 22 (2009), pp. 419-431 View in ScopusGoogle Scholar Cited by (74) Network traffic classification using deep convolutional recurrent autoencoder neural networks for spatial–temporal features extraction 20...
The latest version of the Equipment Intelligence® Data Analyzer was designed for plasma-enhanced chemical vapor deposition (PECVD) and atomic layer deposition (ALD) chambers. It accommodates differences in the wafer flow scenarios in PECVD/ALD chambers in relation to etch chambers (multi-pedestal ...
sputter etching/ real-time virtual metrologyplasma etch controlPlasma etch is a semiconductor manufacturing process during which material is removed from the surface of semiconducting wafers, typically made of silicon, using gases in plasma form. A host of chemical and electrical complexities make the ...
Robust virtual metrology of plasma etch tools using Growing Structure Multiple Models Systems with Dynamic Partial Least Squares modelsTraditional semiconductor manufacturing factories have relied on run-to-run process control with external metrology. Only the most critical processes have metrology on every ...
Macgearailt, "Gaussian process regression for virtual metrology of plasma etch," in Signals and Systems Conference (ISSC 2010), IET Irish, pp. 42-47, 2010.Shane Lynn, John Ringwood, and N. Macgear- ailt. Gaussian process regression for virtual metrology of plasma etch. In Signals and ...
Plasma etchAs a useful tool for process control in a high volume semiconductor manufacturing environment, virtual metrology for the etch rate in a plasma etch process is investigated using optical emission spectroscopy (OES) data. Virtual metrology is a surrogate measurement taken from the process ...
Real-time Virtual Metrology and Control of Plasma Electron Density in an Industrial Plasma Etch ChamberShane A LynnNiall MacgearailtJohn Ringwood