METHOD OF ETCHING PLANAR TYPE MULTIELEMENT SEMICONDUCTOR DEVICESATOU MATSUTERUKONDOU KENICHI
[Also in Division H1] A Cr layer 7, which is itself shaped by etching through a photoresist mask 8, is used as an etching mask to define the shape of a Pt layer 6 on a semi-conductor device, the Cr layer 7 subsequently being removed. In the embodiment a Si body 1 provided with ...
hindering the progress of complementary devices and circuits. In this work, we propose an inorganic blending strategy to activate the hole-transporting character in an inorganic semiconductor compound, namely tellurium-selenium-oxygen (TeSeO). By rationally combining...
and the sacrificial buffer layer is removed by selective etching with respect to the functionalized layer, so that the method enables manufacturing the semiconductor structure 来源基体破碎并且转移在来源基体的上部从来源基体到支持基体,并且有选择性的蚀刻去除牺牲缓冲层数关于functionalized层数,因此方法使能制造半...
aMethod for etching a silicon material vapor phase to decompose a defined part of the material for dosage of impurities of the material during fabrication of an optical, electronic or opto-electronic component (all claimed). 方法为铭刻硅物质蒸气阶段分解材料的一个被定义的部分为材料的杂质剂量在所有...
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PROBLEM TO BE SOLVED: To provide a semiconductor device tape carrier, a semiconductor device and a semiconductor device tape carrier manufacturing method, which can achieve a flat and uniform etching surface and form a stepped portion ha... 平本 正明 被引量: 0发表: 2013年 ...
Electrode pads of the semiconductor chip 15 and the leads 12 for signal connection are connected electrically to each other by metal thin wires 16. Then, the members are sealed inside a sealing resin 17. A half etching operation or the like is executed to the rear side of the die pad 13...
that the ions are extracted from the plasma through the grid apertures and form a low energy ion beam for bombarding the wafers for etching the same. ... V Godyak 被引量: 0发表: 2009年 Switching Power Supply using Transformer Resonant ZVS-PFM / ZCS-PFM Inverter For Magnetron Drive and ...