1. A dry etching method for AlxGa1-xN(0≤x≤1) semiconductors comprising the steps of: introducing an etching gas into a reaction chamber (20) under vacuum; applying high-frequency power to said gas for producing plasma thereof; and etching said AlxGa1-xN(0≤x≤1) semiconductor with sai...
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further miniaturization and integration of semiconductor integrated circuits. 聽The author describes the device manufacturing flow, and explains in which part ...
This book is a must-have reference to dry etching technology for semiconductors, which will enable engineers to develop new etching processes for further m... J Palmer,B Boardman 被引量: 27发表: 1998年 REDUCTION OF CLC MATERIALS MN AND CU OXIDES FROM FIRST PRINCIPLES CALCULATIONS Chemical loopi...
0 有用 醋溜白菜 2024-03-08 15:36:17 上海 适合初学者,日文全书标题有初学者字样,翻译英文就去掉了,内容有些匮乏 我要写书评 Dry Etching Technology for Semiconductors的书评 ··· ( 全部0 条 ) 论坛 ··· 在这本书的论坛里发言 + 加入购书单 ...
In microwave dry etching, the substrate/resist etching selectivity is controlled by adding a material, such as an additional gas, to the reaction gas plasma that heats the substrate with greater energ
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当当中国进口图书旗舰店在线销售正版《【预订】Dry Etching Technology for Semiconductors 9783319102948》。最新《【预订】Dry Etching Technology for Semiconductors 9783319102948》简介、书评、试读、价格、图片等相关信息,尽在DangDang.com,网购《【预订】Dry Etch
Kazuo NojiriSpringer International PublishingNojiri, K. "Mechanism of Dry Etching." Dry Etching Technology for Semiconductors. http://www.springer.com/cda/content/document/cda_downloaddocument/9783319102948- c1.pdf?SGWID=0-0-45-1487900-p176892364...
ChemInform Abstract: Dry Etching of Aluminum/TiW Layers for Multilevel Metallization in VLSIdoi:10.1002/chin.198840303technology of materials, lasers, semiconductors, superconductorstungsten, Wtitanium, Tialuminum, Alsilicon, SiP. MAYGEC Hirst Res. Cent., East Lane, Wembley, Middlesex HA9 7PP, UK...
Download PDF 6893971 US Patent References: 6579802Method of forming smooth morphologies in InP-based semiconductors2003-06-17Pierson et al.438/706 6439154Plasma processing apparatus for semiconductors2002-08-27Fukuda et al.118/723I 5877032Process for device fabrication in which the plasma etch is con...