Next, a rocking curve measurement (or w measurement) is performed by rocking the thin-film sample while the detector is fixed at a fixed 2q angle to record diffraction intensities to check the full width at half maximum intensity (FWHM) of the peak. If the FWHM of the peak is less ...
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Promising Thin-Film Strain-Resistor Pressure Sensors for Rocket and Aviation Techniques. Measurement Techniques 47, 474–480 (2004). https://doi.org/10.1023/B:METE.0000038114.80639.d4 Download citation Issue DateMay 2004 DOIhttps://doi.org/10.1023/B:METE.0000038114.80639.d4 strain-resistor sensor ...
For thin film measurement, the 3ω method and the transient thermoreflectance technique including both time-domain and frequency-domain analysis are widely employed. This work reviews several most commonly used measurement techniques. In general, it is a very challenging task to determine thermal ...
finite element and experimental modal analysis techniques were used to quantify the effects of temperature and relative humidity on the pellicle film stress. ... JS Macdonald,RL Engelstad,∇ E.G. Lovell ∇ 被引量: 0发表: 0年 Combination thin-film stress and thickness measurement device A ...
From the HAADF-STEM contrast and EDS profile analysis, it can be observed that the interfacial layer of the film in contact with the substrate is always the RS layer. This observation is crucial to explain the influence of the substrate in the crystalline quality of the sample. The epitaxial...
This requires development of films under controlled condition, monitoring during film growth, and precise in situ measurement of thin film parameters during film growth and finally after production. Among available methods for measurement of thin film parameters, nuclear techniques are those in which ...
requires a knowledge of the optical properties of the substrate (i.e. the wafer) in order to detect a film present thereon. While these are known thin film measurement techniques they have been implemented in the semiconductor area only for film thickness measurement and also are relatively ...
irradiating a sample with an electron beam to detect a secondary electron beam dose, capable of performing accurate measurement without any time and labor, and a method for manufacturing a thin-film sample by FIB performing control using this film thickness measurement method of the thin-film ...
The measurement of thin film stress using phase shifting interferometry A new technique for determining the stress of thin films is described. This technique combines digital phase shifting interferometry with image-processing ... CL Tien,CC Lee,CC Jaing - 《Journal of Modern Optics》 被引量: 78...