This invention is directed to an etchant and to a process for its use. The etchant comprises a synergistic combination of hydrogen peroxide and molybdenum as oxidants in acidic solution. The combination of oxidants provides for sustained etching at an exalted rate. The etchant is useful for etc...
etching 1.A process in which a special needle is used to draw a design on a metal plate overlaid with wax. The plate is then treated with acid, inked, and finally used to print reproductions of the design. 2.Developed in the sixteenth century, engraving on a waxcovered metal plate whic...
Etching (often considered as decomposition) is one of the key considerations in the synthesis, storage, and application of metal nanoparticles. However, the underlying chemistry of their etching process still remains elusive. Here, we use real-time electrospray ionization mass spectrometry to study the...
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– the actual etching part of the process When the plate is immersed into acid* the exposed areas are bitten and when the wax is removed the drawn image is revealed as having been “etched” into the plate. The plate can then be inked up with ink being driven into the etched lines. ...
Plasma etching as applied to many of the materials encountered in the fabrication of LSI's is complicated by loading effect--the dependence of etch rate on the integrated surface area to be etched. This problem is alleviated by appropriate choice of etchant and etching conditions. Appropriate cho...
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Process and solution for the etching of Al-Cu layers for the production of electronic circuits 来自 掌桥科研 喜欢 0 阅读量: 8 申请(专利)号: DE1998608722T 申请日期: 1998-12-18 公开/公告号: DE69808722T2 公开/公告日期: 2003-06-12
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