Process for producing by sloping etching a thin fi 优质文献 相似文献 参考文献 引证文献Method for fabricating self-aligned thin-film transistors to define a drain and source in a single photolithographic step A method for forming a thin film transistor having source and drain electrodes self-aligned...
PROCESS FOR MAKING PRINTED CIRCUITS AND THE LIKE BY STEP-BY-STEP ETCHINGdoi:US3455751 AFrantzen, John JUS
The present invention uses a two-step etching process, the first step by wet etching using isotropic etching characteristics of an interlayer dielectric in contact with the stepped hole was kind of a bowl-shaped morphology; the second step by dry etching using anisotropic dry etching characteristics...
Process: Step-by-Step Precision EngineeringLoad: Ensuring Smooth Handling and Unmatched Efficiency(3 meters): Precision Loading Length+Etching: Unleashing the True Potential of Metal Surfaces(3 meters)+ : Consistent Etching ExcellenceMicroEtching: Fine-Tuned for Detailed Craftsmanship(1 meter)+ Washi...
The selectiveetchingof the evaporated or squeezed layers is a critical step in preserving yield. 蒸发层和溅射层的选择刻蚀是保证成品的关键步骤. 辞典例句 The resolution of anetchingprocess is a measure of the fidelity of pattern transfer.
PURPOSE:To remove an anodic oxidized film completely from the surface of InP and to prevent under-etching by carrying out etching using 5-20% aq. phosphoric acid soln. as an etching liquid for the anodic oxidized film on InP. CONSTITUTION:An anodic oxidized film of InP which is a material...
based on either amicrowaveor low-field toroidalRF source, provides high density active radicals to create a protective oxide layer on the wafer surface. This layer not only protects the surface from further contaminants and moisture, it also protects specific areas from the next process step and ...
Step 4: The Etching Process Once the second coat of marker is completely dry it is time to give the board a bath in ferric chloride. Ferric chloride is a corrosive, acidic chemical compound that will eat away all copper on the board that is not protected by the marker’s ink. Pour a...
By using a two-step RTP (rapid thermal processing) process, the wafer is provided which has an ideal semiconductor device region secured by controlling fin... YH Mun,K Kim,CG Koh,... 被引量: 0发表: 2010年 Research on Quartz Wet Etching and Flatting Process of Sidewall Arris Quartz gyros...
A process and method for accurately defining polycrystalline silicon patterns from a masking member. The critical dimensions of the silicon patterns are controlled by a diffusion step. Self-limiting etching is achieved through use of an etchant which discriminates between doped and undoped polycrystallin...