扫描电子显微镜(ScanningElectronMicroscope)基础知识 一、扫描电子显微镜的工作原理 扫描电镜是用聚焦电子束在试样表面逐点扫描成像。试样为块状或粉末颗粒,成像信号可以是二次电子、背散射电子或吸收电子。其中二次电子是最主要的成像信号。由电子枪发射的能量为5～35keV的电子,以其交叉斑作为电子源,经二级聚光镜及物镜...
Scanning electron microscope for versatile materials imaging and analysis. Apreo SEM is suited for the analysis of nanoparticles, catalyst, powders and nanodevices.
电子显微镜(SEM,电镜)ScanningElectronMicroscope “扫描电子显微镜”定义：Scanningelectronmicroscope（SEM）。定义1：用电子枪（一次电子）对样品表面扫描使其成像的电子显微镜。定义2：应用电子束在样品表面扫描激发出二次电子成像的电子显微镜。主要用于研究样品表面的形貌与成分。所属学科：光学仪器（二级学科）；电子光学...
本公司生产销售扫描电镜 扫描电镜,提供扫描电镜专业参数,扫描电镜价格,市场行情,优质商品批发,供应厂家等信息.扫描电镜 扫描电镜 品牌茁彩 ZCI BIO|产地上海|价格650.00元|型号ZC1139|包装规格0.2kg|产品名称扫描电镜(SEM)|实验周期3-4周|用途范围科研|产品规格个|是否进口
Apreo 2 Scanning Electron Microscope features High performance, resolution, and contrast High performance, resolution, and contrast The combination of advanced optics, detection and automation in Apreo 2 makes obtaining high resolution imaging possible even for users new to SEM. ...
1、扫描电子显微镜 (ScanningElectronMicroscope) 基础知识一、扫描电子显微镜的工作原理 扫描电镜是用聚焦电子束在试样表面逐点扫描成像。试样为块状或粉末颗 粒,成像信 号可以是二次电子、背散射电子或吸收电子。其中二次电子是最主要 的成像信号。由电子 枪发射的能量为 535keV的电子,以其交 叉斑作为电子源,经二...
PURPOSE:To make a observation field large and high resolution observation possible by moving a means to shield an electric field on an optical axis and a shielding electrode to the end part of a mirror body in a scanning electron microscope to obtain an observation image by detecting secondary ...
The meaning of SCANNING ELECTRON MICROSCOPE is an electron microscope in which a beam of focused electrons moves across the object with the secondary electrons produced by the object and the electrons scattered by the object being collected to form a thr
Field-Emission Environmental Scanning Electron Microscope 型号:美国FEI Quattro S 功能:用于材料表面、断面形貌观察,微区成分定性定量分析。 技术参数: ﹡分辨率:1.0nm(30KV, SE) ﹡附件:X射线能谱仪(EDS)、电子背散射衍射仪(EBSD) ﹡放大倍数:300万倍 Model: FEI Quattro S Function: Used for observation of...
SCANNING ELECTRON MICROSCOPE 专利名称：SCANNING ELECTRON MICROSCOPE 发明人：HIRATA YOSHIHIRO,UCHIUMI HIROSHI,OBARA YOICHI 申请号：JP5848578 申请日：19780517 公开号：JPS5834897B2 公开日：19830729 专利内容由知识产权出版社提供 摘要：PURPOSE:To make it possile to reduce the attrition of a filament and ...