Weisweiler W.RF-Sputtered SiC Coatings on Carbon Fibers. Thin Solid films . 1987Fitzer, E.: R-F Sputtered SiC Coatings on Carbon Fibers. Thin Solid Films, Vol. 170, 1987, pp. 93-108.R.f.-sputtered SiC coatings on carbon fibres. W. Weisweiler,E. Fitzer,G. Nagel,H. J?ger. Thin...
Hussain, Microstructural and electro- chemical properties of rf-sputtered LiMn2O4 thin film cathodes, Appl. Nanosci. 2 (2012) 401-407.Rosaiah, P. and O. Hussain, Microstructural and electrochemical properties of rf- sputtered LiFePO4 thin films. Ionics, 2014. 20(8): p. 1095-1101....
【预售 按需印刷】RF- Sputtered Cadmium Oxide thin films for gas sensing application 作者:Gadipelly Anil Kumar出版社:KS OmniScriptum Publishing出版时间:2015年02月 手机专享价 ¥ 当当价 降价通知 ¥790.50 配送至 北京 至 北京市东城区 服务 由“中图图书旗舰店”发货,并提供售后服务。
For the FeSix films deposited at 300 °C for 30 min, ε-FeSi transformed to β- FeSi2 in RF-sputtered films due to long time annealing of 10 h. It can be concluded that high-temperature and long-time annealing is necessary for the ε-FeSi bonds in the FeSix films to decompose ...
Diffusion of Cu into rf-sputtered iron oxide films: Osamu Ishii,J appl Phys,63, 1988, 4753–4755 来自 Elsevier 喜欢 0 阅读量: 4 DOI: 10.1016/0042-207X(89)90773-2 年份: 1989 收藏 引用 批量引用 报错 分享 全部来源 求助全文 Elsevier ...
M. Abusnina, H. Moutinho, M. Al-Jassim, C. Dehart, M. Matin, Fabrication and characterization of CZTS thin films prepared by the sulfurization of RF- sputtered stacked metal precursors, J. Electron. Mater. 43 (2014) 3145e3154.
RF magnetron sputtering of calcium phosphate (CaP) coatings is a promising technique to apply thin bioactive films on bulk implant materials. In this paper the properties of the interface between RF sputtered coatings and simulated body fluids (SBFs) are related to the ability to form CaP crystal...
phase-separation and hybridization were obtained for the Fe-Si-O films prepared in the oxygen-argon flow ratio VO2/Vtotal<1.0%, magnetic field Bappl≤1.0 T regime, indicating that not only the distribution of plasma but also the angular distribution of sputtered atoms are influenced by a high...
However, RF sputtered PSG film has not been explored as a sacrificial layer in MEMS. Certain advantages are envisaged in sputtering process over CVD technique because of lower deposition temperature, especially if MEMS part is being realized in “post-CMOS” processing. Due to these advantages, ...
The crystallinity and morphology of thin, radio-frequency (rf) -sputtered MoS2films deposited on 440C stainless steel substrates at both ambient (70°C) and high temperatures (245°C) were studied by scanning electron microscopy (SEM) and by x-ray diffraction (Read thin-film photography and020...