K. Torii et al., Dielectric Properties of RF Magnetron Sputtered (Ba,Pb) (Zr,Ti) O 3 Thin Films , Jpn. J. App; Phys. vol. 31 Part1, No. 9B, pp. 2989 2991 (1992).Torii, K. et al., " Dielectric Properties of Rf-Magnetron-Sputtered (Ba,Pb)(Zr,Ti)O3 Thin Films ", in ...
MAGNETRON SPUTTERING: OVERVIEW Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target. The ions strike the target and atoms are ejected (or sputtered) from the surface. These atoms travel towards the substrate and incorporate into the growing f...
Poly-crystal zinc oxide thin films with c-axis orientation have been successfully grown on the silicon substrate by r.f. magnetron sputtering technique. A systematic study has been made of the influence of substrate temperature on the film structural and optical properties. For SAW device ...
Vredenberg, "Initial reactivity of rf magnetron sputtered calcium phosphate thin films in simulated body fluids", Applied Surface Science, 246 183-192 (2005).van der Wal E, Wolke JGC, Jansen JA, Vredenberg AM (2005) Initial reactivity of rf magnetron sputtered calcium phosphate thin films in ...
Indium tin oxide (ITO) films of low resistivity, high transmittance and good figure of merit were prepared by radio frequency magnetron sputtering, at different substrate temperatures (Ts) under such a high λ/d value and used as anti-reflection layer in heterojunction solar cells. For film depo...
MAGNETRON SPUTTERING: OVERVIEW Sputtering is a plasma based deposition process in which energetic ions are accelerated towards a target. The ions strike the target and atoms are ejected (or sputtered) from the surface. These atoms travel towards the substrate a...
Growth and properties of sputtered highly (100)-oriented oxygenated AlN thin films for SAW sensing applications Article 03 January 2021 Reactive magnetron sputtered AlN thin films: structural, linear and nonlinear optical characteristics Article 04 May 2023 References A. Khanna and D. G. Bhat,...
Substrate Temperature Influenced Structural and Electrical Behaviour of~RF Magnetron Sputtered Ag_2Cu_2O_3 Films and Pierson, J.F., Substrate temperature influenced structural and electrical behaviour of RF magnetron sputtered Ag2Cu2O3 films,ActaPhysPolonica, A, 2012,... A Sreedhar,MHP Reddy,S ...
Effect of substrate temperature on structural, morphology and optical properties of RF magnetron sputtered CZT thin films Home All Journals Physical Sciences Materials Technology List of Issues Volume 30, Issue 4 Effect of substrate temperature on struc ... ...
RF magnetron sputtering was used to prepare thin films from a Si3N4 target using Ar-sputtering. Film thickness was directly proportional to sputtering time, and the film deposition rate increased linearly with both the RF discharge power in the range 60–200 W and the Ar pressure up to 2.12...