RF SPUTTERING Radio Frequency Sputter deposition of insulating materials cannot be done with DC power. Materials such as oxides, nitrides, and ceramics have very large DC impedance and require prohibitively high voltages to ignite and maintain a plasma. Luckily, the impedance of these materials change...
RF(Radio Frequency) 射频电源在工业生产和研发中有着广泛的应用前景。在包括反应离子刻蚀(RIE),化学气相沉积(PECVD),磁控溅射(Sputtering)等领域,都有着广泛的应用。 霍廷格RF电源产品,通过研发团队多年持之以恒,不断研发创新,与国内外各行业的领头企业深度合作,积极响应市场和客户端的需求,在各个行业市场中取得了...
reactive sputtering反应溅射 相似单词 sputteringn. 溅射 RF无线电频率 Rf元素鈩(rutherfordium)的符号 rf=right field (棒球)右外场 rf.【缩写】 1.=reef 2.=refund RF ID无线频率辨认系统(=Radio Frequency-Identification) RF-ID是使卡片和有与卡片类似功能形状相异的装置,在超过好几公分以上的距离上沟通的装置...
A first dielectric layer is 3 to 400 Angstroms thick, and formed on the p-MTJ sidewall with a physical vapor deposition RF sputtering process to establish a thermally stable interface with the p-MTJ up to temperatures around 400掳 C. during CMOS fabrication. The first dielectric layer may ...
4.Preparation of BN Films on Steels by Radio Frequency Magnetron Sputtering Method;钢基表面射频磁控溅射法制备BN薄膜 5.Si rich SiO2 films have been prepared by a rf magnetron sputter method.用射频磁控溅射法制备了富硅二氧化硅薄膜。 6.Study on Properties of ZrW_2O_8 Thin Films Prepared by Radio...
doi:10.1007/978-0-387-48998-8_1332Thin-film deposition technique which uses a radio frequency (e.g. [equation][equation]) to create a plasma consisting of ions of a process gas (Ar in the case of this investigation). These ions...Dongqing Li ProfSpringer US...
12.Preparation of Nanomaterials by Hydrothermal and Reactive Radio-frequency Magnetron Sputtering;水热法及反应磁控溅射制备纳米材料 13.Study of AlN Thin Films Deposited on Mo Electrode by Reactive Magnetron SputteringMo电极上磁控反应溅射AlN薄膜 14.The Craft Study on Color of ZrN Decorative Coating by ...
Nanocrystalline TiO_2 thin films were prepared by reactiveRF sputtering, then the samples were treated by Ar radio frequency plasma. 用反应射频溅射法在导电玻璃上制备TiO2薄膜,并用Ar射频等离子体对TiO2薄膜进行处理。 更多例句>> 2) radio frequency sputtering ...
A Langmuir probe study of the discharge condition in a typical rf sputtering system operating at various frequencies was made. Ionization probability has been found to be related to the discharge frequency. If has been observed that the plasma potential is related to the frequency, tending to ...
6) DC-reactive magnetron sputtering 直流磁控溅射法 例句>> 补充资料:磁控溅射 分子式:CAS号:性质:用一个环形永久磁体在乎板形靶上产生环形磁场,在磁场作用下,电子被约束在一个环状空间内,形成高密度的等离子环。在等离子环内,电子不断地使Ar原子变成Ar离子,Ar离子被加速后打向靶表面,把靶内的原子溅射出来,...