MKS ASTRONi ASTeX AX7670-30 RPS Remote Source Plasma 远程源等离子维修找永佳创工业自动化售后有保障,维修速度快,成功,收费合理,关键是永佳创工业自动化公司,规模还大,售后服务靠得住,十几年技术支持。 深圳市永佳创工业自动化有限公司主要服务于太阳能光伏、PVD镀膜,半导体薄膜、离子注入、刻蚀,平板显示,光盘、光...
Chamber Cleaning with Advanced Energy Remote Plasma Sources Jan. 7, 2021 In this video, learn how Advanced Energy's MAXstream remote plasma source (RPS) is used in CVD chamber cleaning. Extending AE’s leadership in process power, MAXstream delivers reliable performance across a broad range of...
RPS-CH24P1 Remote Plasma Source for High Flow Applications 1Products RPS-CM12P1 Remote Plasma Source for ALD, CVD and PVD Chambers 1Products
A remote plasma source (RPS) excites a processing gas into a plasma and delivers it through a supply tube to a manifold in back of a showerhead faceplate. The chamber is configured for oxidizing and reducing plasmas in the same or different processes when oxygen and hydrogen are selectively ...
Remote Plasma Source (RPS) Mechanical Analysis Methodology Through the use of a plasma mass spectrometer coupled with an energy filter, the authors have observed that reactive ion energy distributions can be modifi... S Polak,C Dan,R Grilley,... - Avs International Symposium & Exhibition 被引量...
A new remote plasma source (RPS) driven by capacitively coupled VHF power is investigated and compared with alternative technologies. The generation of plasma by high frequency capacitive coupling, opposed to inductive coupling, results in noticeable differences in plasma behaviors. Plasma densities near...
Advanced Energy’s MAXstreamTM line is the next generation of remote plasma sources for chamber cleaning.
The exposure of this starting material to a plasma from the RPS causes a portion of the molecular oxygen to dissociate into atomic oxygen, a highly reactive radical species that will chemically react with an organo-silicon precursor (e.g., TMOS, OMCTS) at much lower temperatures (e.g., ...
The present invention provides a remote plasma source mountable on a process chamber and connectable on one end to a gas inletting system and on the other end to a gas distribution system disposed in a process chamber. Preferably, a conventional microwave generator is utilized to deliver microwave...
Plasma density measurement and downstream etching of silicon and silicon oxide in Ar/NF_3 mixture remote plasma source In this study, plasma density measurements were performed near the plume region of the remote plasma source (RPS) in Ar/ gas mixtures using a microwave cut... HJ Yeom,DH Cho...