MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries. Remote Plasma Source
In this video, learn how Advanced Energy's MAXstream remote plasma source (RPS) is used in CVD chamber cleaning. Extending AE’s leadership in process power, MAXstream delivers reliable performance across a broad range of flow rates, increasing productivity in semiconductor process equipment. 相关...
The Paragon AX7710MKS-01 Remote Plasma Source is designed for high gas dissociation rates (>98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. ...
Paragon remote plasma source is designed for high gas dissociation rates (> 95%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr for cleaning CVD and ALD/ALE process chambers.
The R*evolution® III integrated remote plasma source, with improved capability over the earlier model, provides the highest performing and cleanest source of reactive gas species required in the processing of semiconductor wafers.Specifications Type AX7695 Integrated Remote Plasma Source Ignition Gas...
a让我们试试 Let us try[translate] aRemote Plasma Source Clean Subsystem 遥远的血浆来源干净的子系统[translate]
KDE Plasma Desktop container designed for Kubernetes with direct access to the GPU with EGL using VirtualGL and Vulkan for GPUs with WebRTC and HTML5, providing an open source remote cloud graphics or game streaming platform. Does not require /tmp/.X11-unix host sockets or host configuration....
Plasma sources for NF3 and fluorine gases are a remote gas source to clean undesired deposits from interior walls of thin film deposition process chambers.
The present invention provides a remote plasma source mountable on a process chamber and connectable on one end to a gas inletting system and on the other end to a gas distribution system disposed in a process chamber. Preferably, a conventional microwave generator is utilized to deliver microwave...