MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries
The Paragon AX7710MKS-01 Remote Plasma Source is designed for high gas dissociation rates (>98%) of NF3 with gas flows up to 8 slm and pressures up to 10 Torr. ...
MKS provides multiple options for radical generation including Toroidal and Microwave based Remote Plasma Sources supporting Fluorine, NF3, oxygen, nitrogen and hydrogen process chemistries
System for capacitively coupled into the plasma energy, igniting a plasma in the remote plasma source, to prolong, methods, and this disclosure describes apparatus. Power is provided by a first electrode that is surrounded by it in part or surrounds the second electrode at least. The second ...
Chamber Cleaning with Advanced Energy Remote Plasma Sources Jan. 7, 2021 In this video, learn how Advanced Energy's MAXstream remote plasma source (RPS) is used in CVD chamber cleaning. Extending AE’s leadership in process power, MAXstream delivers reliable performance across a broad range of...
Remote plasma source 专利名称：Remote plasma source 发明人：Kevin Fairbairn,Hari K. Ponnekanti,David Cheung,Tsutomu Tanaka,Malcal Kelka 申请号：US08/751486 申请日：19961118 公开号：US05844195A 公开日：19981201 专利内容由知识产权出版社提供 摘要：The present invention provides a remote plasma source ...
MKS ASTRONi ASTeX AX7670-30 RPS Remote Source Plasma 远程源等离子维修找永佳创工业自动化售后有保障,维修速度快,成功,收费合理,关键是永佳创工业自动化公司,规模还大,售后服务靠得住,十几年技术支持。 深圳市永佳创工业自动化有限公司主要服务于太阳能光伏、PVD镀膜,半导体薄膜、离子注入、刻蚀,平板显示,光盘、光...
Remote Plasma Source. 来自 findarticles.com 喜欢 0 阅读量: 87 年份: 2007 收藏 引用 批量引用 报错 分享 全部来源 求助全文 findarticles.com 研究点推荐 Remote Plasma 0关于我们 百度学术集成海量学术资源,融合人工智能、深度学习、大数据分析等技术,为科研工作者提供全面快捷的学术服务。在这里我们保持...
REMOTE PLASMA SOURCE 专利名称：REMOTE PLASMA SOURCE 发明人：FAIRBAIRN KEVIN,ケヴィン フェアベア ン,PONNEKANTI HARI,ハリ ポンネカン ティ,DAVID CHUUNG,デイヴィッド チューン グ,TANAKA TSUTOMU,ツトム タナカ,KELKAR MUKUL,ムクル ケルカー 申请号：JP2008147181 申请日：20080604 公开号：JP200...
The conventional remote plasma source technology discussed earlier entails the following problems: First, to use microwave plasma, it is necessary to manufacture the second plasma discharge chamber using microwave-transparent materials, such as sapphire and quartz. Such materials tend to break easily, pa...