尼康基于开创性的Streamlign平台开发了 NSR-S620D,不仅可以实现 32 nm 的双图案光刻,还可以为下一代应用提供可扩展性。随后是进化型 NSR-S621D、S622D、S630D 和 S631E 浸入式扫描仪,适用于低至 7 nm 节点及以上节点的应用。
Reduction ratio1:5 Exposure field22 mm square to 17.9 (H) × 25.2 (V) mm Alignment accuracy (EGA, |M| + 3σ)≦ 70 nm Alignment systemLSA (standard), FIA (optional), LIA (optional) Metrology/Inspection Systems Automatic Macro Inspection System AMI-5600/3500/3000 MarkⅡ ...
#8683-26 Mix-and-Match Overlay Performance of the NSR-S622D Immersion Scanner #8683-53 Comprehensive Thermal Aberration & Distortion Control of Lithographi Lenses for Accurate Overlay #8683-55 High-Productivity Immersion Scanner Enabling 1x nm hp Manufacturing SPIE Advanced Lithography 2012 #8322-40...