Practical/ electron resistsintegrated circuit technologypolymer blends/ positive electron beam resistsmethyl methacrylate-styrenebutyl methacrylate-styreneplasma etch resistance measurementscomb copolymers/ A6140K Structure of polymers, elastomers, and plastics B2550G Lithography (semiconductor technology)...
The helium ion microscope (HelM) holds immense promise for nano-engineering and imaging with scope for in-situ chemical analysis. Here we will examine the potential of secondary electron hyperspectral imaging (SEHI) as a new route to exploring chemical variations in both two and three dimensions....
[ A.F. MilesJ.M.G. CowieR.H. BennettD.R. Brambley]PolymerNew thermally crosslinkable electron-beam resists: 1. Itaconic anhydride—methyl methacrylate copolymers. A. F. Miles and J. M. G. CowieR. H. Bennett and D. R. Brambley. Polymer . 1991...
A new method of evalution of the effect of electron beam on the latent changes in degrading polymer resists has been developed on the base of measurement of the developing curve under an interference microscope. An evalution procedure using the unit parameters (film thickness and development time)...
Yoneyama H,Kitayama M.Relationship between elect ronsensitivity and chemical structures of polymers as EB resists:Poly (lactam thioether) as new positive EB resists. Polymer Engineer . 1986Naoya Ogata et al., "Relationship Between Electron Sensitivity and Chemical Structure of Polymers as E B ...
monomethyl itaconate copolymersgel degradationThe lithographic evaluation of monomethyl itaconate (MMI) and methyl methacrylate copolymers as thermally crosslinkable electron beam resists is descr…[ A.F. MilesJ.M.G. CowieR.H. BennettD.R. Brambley]...
Monemolecular resists: a new class of high resolution resists for electron beam microlithography: A. Barraud, C. Rosilio and A. Ruaudel-Teixier. Solid St. Technol. p. 120 (August 1979)doi:10.1016/0026-2714(80)90375-3ELSEVIERMicroelectronics Reliability...
ELECTRON-BEAM LITHOGRAPHYGEL DEGRADATIONGEL CLEARING DOSEA theoretical description of the electron exposure dose required to solubilize the gel fraction of pre-crosslinked positive resists was first proposed by Suzuki and Ohnishi. These authors proposed that the important factors affecting the sensitivity ...
A new family of highly sensitive negative resists for Deep UV, X-ray and electron beam exposure capable of better than 100 nm resolution and very high pattern aspect ration has been investigated. The resists are based epoxidized novolac resins sensitized with acid generating compounds....
The lithographic evaluation of monomethyl itaconate (MMI) and methyl methacrylate copolymers as thermally crosslinkable electron beam resists is described. Their properties were investigated as a function of copolymer composition and primary molar mass in order to determine an optimum formulation for the ...