A multi-beam mask writer, MBM-2000 is developed for the N3 semiconductor production. It is designed to accomplish high throughput with 16-nm beam and large current density 2.5 A/cm2. It is equipped with curve d
The multi-beam mask writer MBM-3000 is launched in 2023 for next generation EUV mask production. It is equipped with 12-nm beamlets and a powerful cathode that brings out a beam current density of 3.6 A/cm2, in order to achieve higher resolution and faster writing speed than our current...
Multi-beam mask writer MBM-1000 is developed for N5 semiconductor production. It is designed to accomplish high resolution with 10-nm beam and high throughput with 300-Gbps blanking aperture array (BAA) and inline real-time data path. It has better beam resolution than EBM-9500 and has ...
Considering large difference in beam current densities between EBM and multi-beam mask writers (MBM), it is concerning that unexpected charge phenomena occur. Therefore, it is required to reveal the mechanism and to show the resist charging is still predictable in MBM by a common charging model....