Multi-beam mask writer MBM-1000 is developed for N5 semiconductor production. It is designed to accomplish high resolution with 10-nm beam and high throughput with 300-Gbps blanking aperture array (BAA) and inline real-time data path. It has better beam resolution than EBM-9500 and has ...
Still, the questions are clear. Will multi-beam mask writer technology work as advertised? And what does it bring to the party? Why multi-beam? E-beams are used in the production ofphotomasks. Basically, a photomask consists of a chrome layer on a glass substrate. ...
Multi-beam mask writer MBM-1000 is developed for N5. It is designed to accomplish higher throughput than a single-beam VSB writer EBM-9500 at shot count higher than 500 G/pass, and write masks with low sensitivity resist to have better CDU and patterning resolution. Product version of ...