NIRTRILE GLOVES ARE TO BE WORN AT ALL TIMES when handling sample specimens, sample stages, and any parts to be introduced into the tool vacuum chamber. Suitable gloves are located on the workbench to the left of the Hitachi SEM. Sample Preparation Suitable samples for imaging will be ...
Sample insertion 6.Open nitrogen valves (the nitrogen bomb is located behind the SEM)7.Fill up balloon with nitrogen 8.Push the “Air” button on front panel of the SEM to vent the specimen exchanging chamber (SEC)9.Close nitrogen valves 10.Pull the door open (DO NOT OPEN the MV (...
PELCO® X-TREME 10 Hitachi SEM Mount Storage Box with Holder Very strong and rugged clear polycarbonate box to store standard Hitachi SEM mounts with M4 threaded hole in the base. This box is watertight, crushproof and dustproof. The strong hinges, locking clasps and soft silicone O-ring ...
日立HITACHI 4700 FE-SEM Manual说明书用户手册.pdf,日立HITACHI4700FE-SEMManual说明书用户手册用户手册产品说明书使用说明文档安装使用手册HITACHI 4700 FE-SEM COLD FIELD EMISSION 2 STARTING CONDITIONS 3-4 SPECIMEN LOADING 5 SAMPLE INSERTION 6-7 SAMPLE WITHDRAWA
Sample: Fuel cell electrode SEM accelerating voltage: 5 kV Cutting interval: 100 nm Number of cut: 212 Sample courtesy of Prof. Naoki Shikazono, University of Tokyo 3D-EBSD*1 Simultaneous SEM, FIB, and EBSD signals are obtained for 3D-EBSD without moving the stage during FIB sectioning and...
Sample : Textured-structure solar battery(having symmetrical structure due to its crystal orientation.)* When using our company small unit (with an open loop control) Correlation Correlative AFM and SEM Imaging The Hitachi-proprietary SEM/AFM shared alignment holder provides quick and easy measurements...
Note: SEM requires Air Protection Specimen Exchange Chamber*1: Illuminating angle : 0°Eccentric value : 0mm *2: Illuminating angle : 60°Eccentric value : 4mm *3: Si protrudes 100 m from the mask edge.*4: Attainable temperature at the surface of mask within 30 minutes after the cooling...
SEM Vision manufactured by Applied Materials, Inc., the number of polishing scratches of 0.2 μm or more at the surface of the insulating film was measured. As a result, the number was 0 to 1 per wafer in Examples 19 to 22 and Comparative Example 11, indicating that generation of polishi...
The present invention relates to an ion milling device and an ion milling method for fabricating a sample to be observed by using a scanning electron microscope (SEM), a transmission electron microscope (TEM), or the like. BACKGROUND ART ...
Sample Preparation Tools for Electron Microscopes Ion Sputter MC1000 An ion sputter increases the conductivity of non-conductive sample to prevent charging during electron microscope observation. MC1000 employs magnetron sputtering technology to reduce damage to the sample, and the target can be ...