CG6300提供更高的解析度、测量再现性以及高画质高解析度FEB测量装置(CD-SEM)CG6300通过电子光学系统的全新设计提高了解析度,并进一步提高了测量可重复性和图像画质。 电子显微镜线圈能够选择从对象材料反射出的二次电子和背向散射电子,实现BEOL制程*1的Via-in-trench*2和3D-NAND、DRAM工程中的深沟槽・洞底的尺寸...
这台二手HITACHI CG6300高解析度FEB测量装置,不仅在国外保存得完好无损,更因其卓越的性能和稳定的测量精度,在全球半导体设备市场中占有一席之地。设备所具备的高解析度测量技术,可以精确捕捉到微小的电子束变化,为半导体制造过程提供了准确的数据支持。无论是研发阶段的材料分析,还是生产阶段的质量控制,它都能发挥...
Metrology Solution High-Precision Electron Beam Metrology System GT2000 CD-SEM to meet the needs of semiconductor devices development and mass production in High-NA EUV generation Advanced CD Measurement SEM CG7300 For the EUV era device production – High Reliability CD-SEM...
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Lowering the energy of the electron beam ofCD-SEMcan reduce the damage to the sample due to charge-up or electron beam irradiation. CD-SEMmeasurement accuracy and repeatability is guaranteed by improving magnification calibration to the maximum extend. ...
Advanced CD Measurement SEM CG7300 For the EUV era device production – High Reliability CD-SEM Advanced CD Measurement SEM CS4800 A sustainable CD measurement solution to a wide range of 4, 6, and 8 inch wafer Fabs High Voltage CD-SEM CV7300 ...
Advanced CD Measurement SEM CG7300 For the EUV era device production – High Reliability CD-SEM Advanced CD Measurement SEM CS4800 A sustainable CD measurement solution to a wide range of 4, 6, and 8 inch wafer Fabs Advanced High Voltage CD-SEM “CV6300 Series” CV6300 Series is the ...
Advanced CD Measurement SEM CG7300 For the EUV era device production – High Reliability CD-SEM Advanced CD Measurement SEM CS4800 A sustainable CD measurement solution to a wide range of 4, 6, and 8 inch wafer Fabs Advanced High Voltage CD-SEM “CV6300 Series” CV6300 Series is the ...
Metrology Solution High-Precision Electron Beam Metrology System GT2000 CD-SEM to meet the needs of semiconductor devices development and mass production in High-NA EUV generation Advanced CD Measurement SEM CG7300 For the EUV era device production – High Reliability CD-SEM...