半导体前道设备 手动/半自动曝光机全自动曝光机无掩膜光刻机实验型光刻机匀胶/显影设备等离子刻蚀 量产型等离子切割 量产型PVD系统 量产型PECVD系统 量产型ICP 研发及小批量RIE 研发及小批量PECVD 研发及小批量ALD 原子层沉积IBE/IBD 离子束刻蚀/沉积XeF2 Release EtchHF Vapor Release Etch氧化扩散炉CMP研磨抛光系统...
HF vapor release etch is an alternative to wet etch, for etching sacrificial oxide layers to release moving MEMS structures, eliminating stiction and corrosion
Consequently, great care must be taken in the release etch in order to avoid the problem of stiction. Processes used to date range from HF vapor to supercritical fluid processing, but most of these utilize single-wafer technology which severely limits throughput when implemented in production. ...
memsstar’s XERIC™ dry release etch process module is available usingvapor HF (Hydrogen Fluoride) andXeF2(Xenon DiFluoride) chemistries. Combined with the company’s AURIX™ surface modification process module, memsstar is a leader in providing industry-leading release etch and self-assembled monol...
HFVaporEtch NearlyallsiliconMEMSdevicesarecreatedusingasacrificial siliconoxidelayer,whichwhenremoved,“releases”thesilicon MEMSstructureandallowsfreemovement. Siliconoxideistypicallyetchedbyhydrogenfluoride: SiO 2 +4HFSiF4(g)+2H 2 O ThemostwidespreadmethodofHFbasedetchreleaseiswet ...
NEWPORT, Wales, March 21, 2012 /PRNewswire-Asia/ -- SPTS Installs First Vapor HF Release Etch System in China for Shanghai Institute of Microsystem and Information Technology (SIMIT)
the etch rate of metals. Drying of released wet etched structures however causes problems of stiction. Although solutions exist to overcome these problems, it is also possible to circumvent stiction by using an HF vapor release etch. Especially when the wafer temperature ...
A thin silicon-rich nitride film (e.g., having a thickness in the range of around 100A to 10000A) deposited using low-pressure chemical vapor deposition (LPCVD) is used for etch stop during vapor HF etching in various MEMS wafer fabrication processes and devices. The LPCVD silicon-rich nit...
The Primaxx® Monarch300 is a fully integrated, automated VHF etch tool designed to perform selective MEMS etch release via a controlled... 閱讀更多內容 Primaxx® Monarch 25 The Monarch25 is a 25-wafer batch process module designed for medium to high volume HF release etch production appl...
the reduction of the silica was significantly enhanced because the magnesium vapor had a higher vapor pressure. Not only the surface, but also the interior regions of the silica nanoparticles were converted to silicon, leading to an almost total consumption of the silica particles. As a result, ...