direct current sputtering 直流溅射 direct current 直流电 Direct Current 直流电(=DC)流动方向不会发生反转的一种电流。 alternating current/direct current 【电】 交直流电 stopping direct current 隔直流 direct current motor 【机】 直流电动机 direct current transformer 【化】 直流电流互感器 direc...
Electrochromic tungsten trioxide films have been prepared by direct current dc reactive sputtering of a metallic tungsten target in an Ar O2 mixture. Structural and optical properties of tungsten trioxide films have been investigated for different sputtering conditions. The operating electrochromic ...
英文: Direct Current (DC) Direct current is current with no reversals in polarity.中文: 直流直流是指没有正负极性往复变化的电流。英文: A device used to convert direct current into alternating current.中文: 反用换流器用于变直流电为交流电的仪器 ...
1.2 Direct Current (dc) Sputtering Sputtering is an electro-physical process in which a target (rendered cathodic) is bombarded with highly energetic positive ions which, by transferring their energy, cause ejection of particles of the target. The sputtered particles deposit as thin films on substra...
(DC)(di-rekt kŭrĕnt) An electrical current that flows only in one direction; also referred to as galvanic current. Medical Dictionary for the Dental Professions © Farlex 2012 Want to thank TFD for its existence?Tell a friend about us, add a link to this page, or visitthe webmaster...
Direct-Current Current-Transformers (DCCTs) are well-established and employed in particle accelerator research [3,4,5,6,7]. The feasibility of DCCTs for ion thruster applications was first proposed by Volkmar et al. [8]. This paper presents the subsequent studies to further refine the concept...
1) direct current pulse magnetron sputtering 直流脉冲磁控溅射 1. Mo films were prepared on the Soda-lime glass(SLG) substrates bydirect current pulse magnetron sputtering(DC-PMS). 利用直流脉冲磁控溅射方法在玻璃衬底上制备太阳电池背接触Mo薄膜。
We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 100 nm to 1020 nm were deposited on silicon (Si) substrate. The deposition pressure was varied from 12 mTorr to 25 mTorr. The influences of...
Preparation of Sn nano-film by direct current magnetron sputtering and its performance as anode of lithium ion battery Sn thin film on Cu foil substrate as the anode of lithium ion battery was prepared by direct current magnetron sputtering(DCMS). The surface morphology,com... 赵灵智,胡社军,李伟...
Helium charging (or trapping) in the Ti films deposited by direct current (DC)-magnetron sputtering with a He/Ar mixture was studied. Helium atoms with a surprisingly high concentration (He/Ti atomic ratio is as high as 56 at.%) incorporate evenly in deposited film. Apart from the relative...