We fabricated ZnO thin films by employing direct current (DC) magnetron sputtering deposition technique. ZnO films with different thicknesses ranging from 150 nm to 750 nm were deposited on glass substrates. The deposition pressure and the substrate temperature were varied from 12 mTorr to ...
Reactive direct current magnetron sputtering (DCMS) and high power impulse magnetron sputtering (HiPIMS) discharges of carbon in different inert gas mixtures (N2/Ne, N2/Ar, and N2/Kr) were investigated for the growth of carbon-nitride (CNx) thin films. Ion mass spectrometry showed that energies...
SourceEnhancedDirect.CurrentMagnetronSputteringUnderDiferentN2 PartialPressures LIUTian一、vei(刘天伟) ,DENGXin—Lu(邓新绿),WANGXiao—Ying(t4"~:), WANGYing—Min(:E英敏),ZOUJian—Xin(9~建新),DONGChuang(董闯) StateKeyLaboratoryofMaterialsModification,DalianUniversityofTechnology,Dalian116024 2ChinaAcademyof...
ThinFilmsDepositedbyDirect—CurrentReactiveMagnetronSputtering NAYuan-Yuan(纳元元),WANGCong(~聪),LIUYu(RU~) CenterforCondensedMatterandMaterialsPhysics,DepartmentofPhysics,BeihangUniversity,Beijing100191 (Received26November2009) , NandAu—TiN ucontent:from0.5%to 7r%)thinfilmsweredepositedonstainlesssteelsubstra...
Films are deposited from a single Al20Cr20Mo20Si21Ti19 alloy target in various argon/nitrogen atmospheres by direct current magnetron sputtering. Two sets of substrate parameters are examined; one with a substrate temperature of 300 K and the substrate grounded (U0 V, 300 K), and the other...
Deposition and characterization of TiAlSiN nanocomposite coatings prepared by reactive pulsed direct current unbalanced magnetron sputtering This work reports the performance of high speed steel drill bits coated with TiAlSiN nanocomposite coating at different Si contents (5.5–8.1 at.%) prepare... HC ...
Films are deposited from a single Al20Cr20Mo20Si21Ti19 alloy target in various argon/nitrogen atmospheres by direct current magnetron sputtering. Two sets of substrate parameters are examined; one with a substrate temperature of 300 K and the substrate grounded (U0 V, 300 K), and the other...
The Ti-doped ZnO (ZnO:Ti) films were prepared by simultaneous radio frequency (rf) magnetron sputtering of ZnO and dc magnetron sputtering of Ti. The Ti ox... Lin, SS,Huang, JL,Lii, DF - 《Materials Chemistry & Physics》 被引量: 197发表: 2005年 Effect of substrate temperature on opto...
In summary, transparent conductive ZnO:Al (AZO) films have been deposited successfully by DC reactive magnetron sputtering onto flexible PET substrates. By applying a thin Al2O3 buffer layer and proper bias, the overall sheet resistance of AZO films was remarkable reduced. The transmittance spectrum...
reactivemagnetronsputteringatasubstratetemperatureof250。Candanoxygenfluxratioof15:18bymodifyingthe sputteringpower(SP).TheAgOfilmsdepositedapparentlyshowastructuralevolutionfromcubicbiphased(AgO +Ag20)tocubicsingle—phased(Ag20),andtobiphased(Ag20+AgO)structureNotably,thecubicsingle—phased Ag20fihnisdepositedatthe...