Equation (2) calculates the exposure time for each wafer. Tshot ¼ D=Je ð1Þ Twafer ¼ Tshot  ðLEBpitch=LEBsizeÞ2  ðSwafer=SarrayÞ=N ð2Þ where, D: Appropriate dosage level (μC cm−2), Je: Current emission density (μC cm−2), Tshot: ...
(DRAM) cell, said word line voltage control circuit comprising: a sample cell access device; a circuit for forcing a fixed current through said sample cell access device; an amplifier circuit connected to the output of said sample cell access device; a feedback loop between said amplifier ...
1. A method for limiting current in a disk drive read/write head retract circuit comprising the steps of: sensing a temperature at a temperature sensor; generating an output signal at the temperature sensor, the output signal indicating whether the temperature is above a threshold temperature; ...
This aberration is corrected using a method discussed in the section “Aberration correction function”. The system throughput level is estimated using the following equations. Equation (1) calculates the exposure time for a beamlet. Equation (2) calculates the exposure time for each wafer. (1)...
current path of the memory cell;a second driver coupled to the memory cell that passes a second portion of the first current through the first current path;a third driver coupled to the memory cell for passing a first portion of a second current through a second current path;a fourth ...
A method of adjusting a write strategy of a recordable disc comprises steps of: generating a test pattern on a power calibrating area of the recordable disc according to a first write strategy and a f