thin-film deposition 英 [θɪn fɪlm ˌdepəˈzɪʃn] 美 [θɪn fɪlm ˌdepəˈzɪʃn]网络 薄膜沉积; 薄膜沈积
thin film memory 【计】 磁薄膜存储器; 薄膜存储器 thin film formation 【电】 薄膜形成 相似单词 thin film 【计】 薄膜 deposition n. 1.[U]沉积 2.[C]沉积物 3.[U]罢免 4.[C]证词 thin a. 1.薄的;细的;瘦的,瘦削的 2.稀薄的;淡薄的,淡的;微弱的,弱的 3.稀少的,稀疏的;缺乏的 ...
Thin Film Deposition薄膜沉积技术
THINFILMDEPOSITION–Chapter9 Introduction •Manyfilms,madeofmanydifferentmaterials aredepositedduringastandardCMOSprocess. •Requirementsordesirabletraitsfordeposition: 1.Desiredcomposition,lowcontaminates,good electricalandmechanicalproperties. 2.Uniformthicknessacrosswafer,and wafer-to-wafer. 3.Goodstepcoverage(...
Thin Film Deposition 薄膜製程技術 2005/2/20 1 CMOS Fabrication Process 2005/2/20 2 Thin film processes “grown” films – typically “converted” from original substrate material ? example: SiO2 formed by oxidation of Si substrate “deposited” films – crystalline, poly crystalline, amorphous –...
薄膜沉积(ThinFilmDeposition) 1何谓薄膜沉积 在机械工业、电子工业或半导体工业领域,为了对所使用的材料赋与某种特 性在材料表面上以各种方法形成被膜(一层薄膜),而加以使用,假如此被膜经由 原子层的过程所形成时,一般将此等薄膜沉积称为蒸镀(蒸着)处理。采用蒸镀处 ...
surface is stuck by sufficiency energetic particles.Alternative to evaporation.First discovered in 1852, and developed as a thin film deposition technique by Langmuir in 1920.DC sputtering: Metallic films: Al-alloys, Ti, TiW, TiN, Tantalum, Nickel, Cobalt, Gold, etc. The target must be ...
of film on a circular substrate by providing means for rotating the liquid level and a monomolecular film and imparting centrifugal force externally to the monomolecular film for the purpose of orientation thereof on the liquid level thereby shortening the time required for deposition of film.YOSHIMURA...
关键词: Thin film deposition 被引量: 20 摘要: A material is introduced into and heated within a crucible of the sealed type for vaporization purposes and the crucible includes an ejection nozzle. The vapor of the material is then ejected through the nozzle into a vacuum region to strike ...
Thin film deposition system In a system for thin film deposition by vapor growth, the contamination of devices and the formation of particles in the deposited thin film inside the sys... S Sawada,O Kanou,H Wada,... 被引量: 70发表: 1992年 Temperature control apparatus for thin film deposit...