THIN FILM DEPOSITION METHODPROBLEM TO BE SOLVED: To deposit a thin film having a composition which is homogeneous in the film-thickness direction by using a plasma enhanced CVD system having a cylindrical rotating electrode.NAKAHAMA KOJI中濱 康治...
Thin-film deposition methodIn a thin-film deposition method, a substrate is placed in a heat chamber having a pressure equal to or higher than an atmospheric pressure, and the substrate is heated in the heat chamber by supplying gas having a temperature higher than a room temperature by ...
Thin-film deposition method assisted by mid-infrared-FEL We propose the novel application of the mid-infrared (MIR) FEL to the thin-film fabrication process. During the application, a substrate on which a thin fi... M Yasumoto,T Tomimasu,A Ishizu,... - 《Nuclear Instruments & Methods in...
Thin Film Deposition薄膜沉积技术
Film Substrate 蒸发 MassDepositionRateperunitareaofsourcesurface: ()PTP rT M CR emm −=)( 1 coscos 2 2 1 ϕθ θ ϕ r e P P Substrate C m =1.85x10 -2 r:source-substratedistance(cm) T:sourcetemperature(K) P e :evaporantvaporpressure(torr),functionofT ...
MethodsofDeposition: ChemicalVaporDeposition(CVD):APCD,LPCVD,HDPCVDPhysicalVaporDeposition(PVD:evaporation,sputtering) AtmosphericPressure:APCVD Coldwallreactors(wallsnotheated-onlythesusceptor) Lowpressure:LPCVD–batchprocessing. Hotwallreactor AtmosphericPressureChemicalVaporDeposition Transportbyforcedconvection Bydiffu...
thin-film deposition 英 [θɪn fɪlm ˌdepəˈzɪʃn] 美 [θɪn fɪlm ˌdepəˈzɪʃn]网络 薄膜沉积; 薄膜沈积
As thin-film deposition gases, cyclic CFgas and a hydrocarbon gas, e.g., CHgas, are used. These gases are activated as plasma under a pressure of, e.g., 0.1 Torr, to deposit a CF film on a semiconductor wafer at a process temperature of 400° C. using active species thereof....
A plasma thin-film deposition method for depositing a thin film on the surface of an object, wherein a plasma is generated in one or more inert plasmagenic gases and precursor gases, and the plasma is sprayed onto the surface being treated. The one or more precursor gases include at least...
薄膜沉积(ThinFilmDeposition) 1何谓薄膜沉积 在机械工业、电子工业或半导体工业领域,为了对所使用的材料赋与某种特 性在材料表面上以各种方法形成被膜(一层薄膜),而加以使用,假如此被膜经由 原子层的过程所形成时,一般将此等薄膜沉积称为蒸镀(蒸着)处理。采用蒸镀处 ...