2.9 Hard Bake (optional). From the SU-8 datasheets (Microchem): SU-8 has good mechanical properties, therefore hard bakes are normally not required. For applications where the imaged resist is to be left as part of the final device, the resist may be ramp/step hard baked between 150-200...
This paper presents two facile methods to fabricate off-plane lenses made of SU-8, an epoxy-based negative photoresist from MicroChem, on glass for optical interconnection. The methods allow the fabrication of lenses with flexible spot size and focal length depending on SU-8 well size and SU-...
microchem. com/ [ 8] SHAWJ M, GELORMEJ D , LABIANCA N C , et al . Negative photoresist s for optical lit hography[J ] . IBM Journal of Research and Development , 1997 ,41 : 81294 . [ 9] DESPONT M, LORENZ H, FAHRNI N , et al . High aspect ra2 tio ult rat hick , ...
SU-8 was developed by IBM as a thick negative photoresist targeted to the fabrication of molds for electroplating. The epoxy-based negative photoresist has some remarkable properties. First of all, it has a wide range of coating thicknesses: layers from several hundreds of nanometers up to seve...
Instead of metal etch masks, we suggest using SU8 photoresist (MicroChem, Westborough, MA, USA) as an etch mask in conjunction with a sacrificial release layer. Both SU8 and PDMS are etched by RIE with a mixture of CF4/SF6 and O2, but the gas composition for efficient PDMS etching is ...
This paper discusses a novel fabrication process that uses a combination of negative and positive photoresists with positive tone photomasks, resulting in masking layers suitable for bulk micromachining high-aspect ratio microelectromechanical systems (MEMS) devices. MicroChem's negative photoresist Nano SU...
SU-8 3000 Data Sheet英文电子资料.pdf,http://www.kayakumicrochem.jp/ SU-8 3000 Permanent Epoxy Negative Photoresist SU-8 3000 is a high contrast, epoxy based photoresist designed for Applications micromachining and other microelectronic applications, wher
The SU8 films were prepared from the commercial formulation SU8-2 from MicroChem, using the treatment protocols described in the main text. The SU8-2 films were spin-coated onto the cleaned glass at 500 rpm for 6 s and then at 6000 rpm for 30 s. Exposure of the samples was...
MicroChem Corp),放在往复运动的槽中,无氧铜片 上下运动,显影时间为 30～50 min,显影后的结构见 图7。 嵌有聚合单丝的胶模制成后,要进行微电铸工 艺,电铸工艺参数将直接影响波导的几何尺寸。 此 外,真空电子器件对材料的含气量非常敏感,电铸 过 要排除气孔、夹杂的产生。 当电铸过 结束后, 需 结构进行打...
SU-8 photoresist is an important material used in the development of micro-devices [1]. Cross-linked SU-8 structures have been known for their thermal stab